Patent | Date |
---|
Process window compliant corrections of design layout Grant 7,313,508 - Croffie , et al. December 25, 2 | 2007-12-25 |
OPC based illumination optimization with mask error constraints Grant 7,264,906 - Croffie , et al. September 4, 2 | 2007-09-04 |
Mask defect analysis for both horizontal and vertical processing effects Grant 7,149,340 - Filseth , et al. December 12, 2 | 2006-12-12 |
Optical proximity correction method using weighted priorities Grant 7,069,535 - Kobozeva , et al. June 27, 2 | 2006-06-27 |
OPC based illumination optimization with mask error constraints App 20050196681 - Croffle, Ebo H. ;   et al. | 2005-09-08 |
Automatic calibration of a masking process simulator Grant 6,868,355 - Ivanovic , et al. March 15, 2 | 2005-03-15 |
Optical proximity correction method using weighted priorities App 20040250232 - Kobozeva, Olga A. ;   et al. | 2004-12-09 |
Automatic calibration of a masking process simulator App 20040199349 - Ivanovic, Lav ;   et al. | 2004-10-07 |
Wafer process critical dimension, alignment, and registration analysis simulation tool Grant 6,782,525 - Garza , et al. August 24, 2 | 2004-08-24 |
Automatic calibration of a masking process simulator Grant 6,768,958 - Ivanovic , et al. July 27, 2 | 2004-07-27 |
Process window compliant corrections of design layout App 20040128118 - Croffie, Ebo ;   et al. | 2004-07-01 |
Mask defect analysis for both horizontal and vertical processing effects App 20040057610 - Filseth, Paul ;   et al. | 2004-03-25 |
Wafer process critical dimension, alignment, and registration analysis simulation tool App 20040049760 - Garza, Mario ;   et al. | 2004-03-11 |
Optical and etch proximity correction Grant 6,701,511 - Filseth , et al. March 2, 2 | 2004-03-02 |
Mask correction optimization Grant 6,611,953 - Filseth , et al. August 26, 2 | 2003-08-26 |
Method and apparatus for application of proximity correction with relative segmentation Grant 6,532,585 - Petranovic , et al. March 11, 2 | 2003-03-11 |
Method and apparatus for application of proximity correction with unitary segmentation Grant 6,499,003 - Jones , et al. December 24, 2 | 2002-12-24 |
Method And Apparatus For Application Of Proximity Correction With Unitary Segmentation App 20020004714 - JONES, EDWIN ;   et al. | 2002-01-10 |
Performing optical proximity correction with the aid of design rule checkers Grant 6,282,696 - Garza , et al. August 28, 2 | 2001-08-28 |
Optical proximity correction method and apparatus Grant 6,269,472 - Garza , et al. July 31, 2 | 2001-07-31 |
Comparing aerial image to actual photoresist pattern for masking process characterization Grant 6,081,659 - Garza , et al. June 27, 2 | 2000-06-27 |
Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization Grant 6,078,738 - Garza , et al. June 20, 2 | 2000-06-20 |
Reticle and method of design to correct pattern for depth of focus problems Grant 5,972,541 - Sugasawara , et al. October 26, 1 | 1999-10-26 |
Performing optical proximity correction with the aid of design rule checkers Grant 5,900,338 - Garza , et al. May 4, 1 | 1999-05-04 |
Optical proximity correction method and apparatus Grant 5,723,233 - Garza , et al. March 3, 1 | 1998-03-03 |
Performing optical proximity correction with the aid of design rule checkers Grant 5,705,301 - Garza , et al. January 6, 1 | 1998-01-06 |
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer Grant 5,549,934 - Garza , et al. August 27, 1 | 1996-08-27 |
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer Grant 5,456,952 - Garza , et al. October 10, 1 | 1995-10-10 |
Techniques for uniformizing photoresist thickness and critical dimension of underlying features Grant 5,330,883 - Garza July 19, 1 | 1994-07-19 |