loadpatents
name:-0.011768102645874
name:-0.11678910255432
name:-0.00055694580078125
Garza; Mario Patent Filings

Garza; Mario

Patent Applications and Registrations

Patent applications and USPTO patent grants for Garza; Mario.The latest application filed is for "opc based illumination optimization with mask error constraints".

Company Profile
0.22.7
  • Garza; Mario - Sunnyvale CA
  • Garza; Mario - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Process window compliant corrections of design layout
Grant 7,313,508 - Croffie , et al. December 25, 2
2007-12-25
OPC based illumination optimization with mask error constraints
Grant 7,264,906 - Croffie , et al. September 4, 2
2007-09-04
Mask defect analysis for both horizontal and vertical processing effects
Grant 7,149,340 - Filseth , et al. December 12, 2
2006-12-12
Optical proximity correction method using weighted priorities
Grant 7,069,535 - Kobozeva , et al. June 27, 2
2006-06-27
OPC based illumination optimization with mask error constraints
App 20050196681 - Croffle, Ebo H. ;   et al.
2005-09-08
Automatic calibration of a masking process simulator
Grant 6,868,355 - Ivanovic , et al. March 15, 2
2005-03-15
Optical proximity correction method using weighted priorities
App 20040250232 - Kobozeva, Olga A. ;   et al.
2004-12-09
Automatic calibration of a masking process simulator
App 20040199349 - Ivanovic, Lav ;   et al.
2004-10-07
Wafer process critical dimension, alignment, and registration analysis simulation tool
Grant 6,782,525 - Garza , et al. August 24, 2
2004-08-24
Automatic calibration of a masking process simulator
Grant 6,768,958 - Ivanovic , et al. July 27, 2
2004-07-27
Process window compliant corrections of design layout
App 20040128118 - Croffie, Ebo ;   et al.
2004-07-01
Mask defect analysis for both horizontal and vertical processing effects
App 20040057610 - Filseth, Paul ;   et al.
2004-03-25
Wafer process critical dimension, alignment, and registration analysis simulation tool
App 20040049760 - Garza, Mario ;   et al.
2004-03-11
Optical and etch proximity correction
Grant 6,701,511 - Filseth , et al. March 2, 2
2004-03-02
Mask correction optimization
Grant 6,611,953 - Filseth , et al. August 26, 2
2003-08-26
Method and apparatus for application of proximity correction with relative segmentation
Grant 6,532,585 - Petranovic , et al. March 11, 2
2003-03-11
Method and apparatus for application of proximity correction with unitary segmentation
Grant 6,499,003 - Jones , et al. December 24, 2
2002-12-24
Method And Apparatus For Application Of Proximity Correction With Unitary Segmentation
App 20020004714 - JONES, EDWIN ;   et al.
2002-01-10
Performing optical proximity correction with the aid of design rule checkers
Grant 6,282,696 - Garza , et al. August 28, 2
2001-08-28
Optical proximity correction method and apparatus
Grant 6,269,472 - Garza , et al. July 31, 2
2001-07-31
Comparing aerial image to actual photoresist pattern for masking process characterization
Grant 6,081,659 - Garza , et al. June 27, 2
2000-06-27
Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization
Grant 6,078,738 - Garza , et al. June 20, 2
2000-06-20
Reticle and method of design to correct pattern for depth of focus problems
Grant 5,972,541 - Sugasawara , et al. October 26, 1
1999-10-26
Performing optical proximity correction with the aid of design rule checkers
Grant 5,900,338 - Garza , et al. May 4, 1
1999-05-04
Optical proximity correction method and apparatus
Grant 5,723,233 - Garza , et al. March 3, 1
1998-03-03
Performing optical proximity correction with the aid of design rule checkers
Grant 5,705,301 - Garza , et al. January 6, 1
1998-01-06
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
Grant 5,549,934 - Garza , et al. August 27, 1
1996-08-27
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
Grant 5,456,952 - Garza , et al. October 10, 1
1995-10-10
Techniques for uniformizing photoresist thickness and critical dimension of underlying features
Grant 5,330,883 - Garza July 19, 1
1994-07-19

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