Gao; Shaowen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gao; Shaowen.The latest application filed is for "methodology for post-integration awareness in optical proximity correction".

Company Profile

4.5.5

Gao; Shaowen - Clifton Park NY
Gao; Shaowen - Shanghai CN

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Generating risk inventory and common process window for adjustment of manufacturing tool Grant 10,401,837 - Zhang , et al. Sep	2019-09-03
Methodology for post-integration awareness in optical proximity correction Grant 10,386,715 - Wang , et al. A	2019-08-20
Methodology For Post-integration Awareness In Optical Proximity Correction App 20190113837 - WANG; Feng ; et al.	2019-04-18
Generating Risk Inventory And Common Process Window For Adjustment Of Manufacturing Tool App 20190101905 - Zhang; Hongxin ; et al.	2019-04-04
Device resulting from printing minimum width semiconductor features at non-minimum pitch Grant 9,484,300 - Ghosh , et al. November 1, 2	2016-11-01
Printing Minimum Width Features At Non-minimum Pitch And Resulting Device App 20160093565 - GHOSH; Sonia ; et al.	2016-03-31
Printing minimum width semiconductor features at non-minimum pitch and resulting device Grant 9,263,349 - Ghosh , et al. February 16, 2	2016-02-16
Printing Minimum Width Features At Non-minimum Pitch And Resulting Device App 20150130026 - GHOSH; Sonia ; et al.	2015-05-14
Precise positioning system for dual stage switching exposure Grant 8,027,028 - Li , et al. September 27, 2	2011-09-27
Precise Positioning System For Dual Stage Switching Exposure App 20090219503 - Li; Yingsheng ; et al.	2009-09-03

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