GAO; LARRY
Patent Applications and Registrations
Patent applications and USPTO patent grants for GAO; LARRY.The latest application filed is for "selective deposition of carbon on photoresist layer for lithography applications".
- GAO; LARRY - Fremont CA
| Patent | Date |
|---|---|
| Selective Deposition Of Carbon On Photoresist Layer For Lithography Applications App 20220005688 - FUNG; NANCY ; et al. | 2022-01-06 |
| Selective Deposition Of Carbon On Photoresist Layer For Lithography Applications App 20210358751 - GAO; Larry ; et al. | 2021-11-18 |
| Method of etching hardmasks containing high hardness materials Grant 10,867,795 - Fung , et al. December 15, 2 | 2020-12-15 |
| Methods Of Etching Hardmasks Containing High Hardness Materials App 20180337047 - FUNG; Nancy ; et al. | 2018-11-22 |
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