Gans; Fritz

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gans; Fritz.The latest application filed is for "compensation frame for receiving a substrate".

Company Profile

0.3.5

Gans; Fritz - Dresden DE
Gans, Fritz - Grossrohrsdorf DE
Gans; Fritz - Munchen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for compensating for scatter/reflection effects in particle beam lithography Grant 6,953,644 - Ebi , et al. October 11, 2	2005-10-11
Compensation frame for receiving a substrate App 20050016468 - Ruhl, Guenther ; et al.	2005-01-27
Mask for optical projection systems, and a process for its production Grant 6,692,875 - Fischer , et al. February 17, 2	2004-02-17
Method for compensating for scatter/reflection effects in particle beam lithography App 20030228527 - Ebi, Christian ; et al.	2003-12-11
Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns Grant 6,627,392 - Pforr , et al. September 30, 2	2003-09-30
Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns App 20020110753 - Pforr, Rainer ; et al.	2002-08-15
Mask for optical projection systems, and a process for its production App 20020006554 - Fischer, Werner ; et al.	2002-01-17
Phase mask App 20010021476 - Gans, Fritz ; et al.	2001-09-13

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