GANGULI; Seshadri

Patent Applications and Registrations

Patent applications and USPTO patent grants for GANGULI; Seshadri.The latest application filed is for "selective cobalt deposition on copper surfaces".

Company Profile

15.86.111

GANGULI; Seshadri - Sunnyvale CA
Ganguli; Seshadri - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Selective Cobalt Deposition On Copper Surfaces App 20220298625 - YU; Sang-Ho ; et al.	2022-09-22
Low Resistivity DRAM Buried Word Line Stack App 20220278108 - Yang; Yixiong ; et al.	2022-09-01
Deposition Of Silicon-based Dielectric Films App 20220270870 - Bajaj; Geetika ; et al.	2022-08-25
Amorphous Silicon-Based Scavenging And Sealing EOT App 20220254640 - Yang; Yong ; et al.	2022-08-11
Catalyst enhanced seamless ruthenium gap fill Grant 11,401,602 - Yoon , et al. August 2, 2	2022-08-02
Selective cobalt deposition on copper surfaces Grant 11,384,429 - Yu , et al. July 12, 2	2022-07-12
Methods And Apparatus For Metal Fill In Metal Gate Stack App 20220165852 - GANDIKOTA; Srinivas ; et al.	2022-05-26
Methods And Materials For Enhanced Barrier Performance And Reduced Via Resistance App 20220122923 - Chen; Lu ; et al.	2022-04-21
Methods And Apparatus For Seam Reduction Or Elimination App 20220108916 - YANG; Yixiong ; et al.	2022-04-07
Methods for filling features with ruthenium Grant 11,282,745 - Yu , et al. March 22, 2	2022-03-22
Gap Fill Methods For Dram App 20220068935 - Panda; Priyadarshi ; et al.	2022-03-03
Gap fill methods of forming buried word lines in DRAM without forming bottom voids Grant 11,171,141 - Panda , et al. November 9, 2	2021-11-09
Methods And Apparatus For Forming Dual Metal Interconnects App 20210320064 - PARIKH; SUKETU A. ; et al.	2021-10-14
Gap Fill Methods Using Catalyzed Deposition App 20210285102 - Yoon; Byunghoon ; et al.	2021-09-16
Methods and apparatus for forming dual metal interconnects Grant 11,075,165 - Parikh , et al. July 27, 2	2021-07-27
Catalyst Enhanced Seamless Ruthenium Gap Fill App 20210214842 - Yoon; Byunghoon ; et al.	2021-07-15
Selective deposition of aluminum oxide on metal surfaces Grant 11,060,188 - Yu , et al. July 13, 2	2021-07-13
Barrier for copper metallization and methods of forming Grant 10,930,550 - Ganguli , et al. February 23, 2	2021-02-23
Methods And Apparatus For Forming Dual Metal Interconnects App 20210020569 - PARIKH; SUKETU A. ; et al.	2021-01-21
Selective Deposition On Non-Metallic Surfaces App 20200350204 - Yu; Sang Ho ; et al.	2020-11-05
Methods For Filling Features With Ruthenium App 20200343136 - YU; SANG-HO ; et al.	2020-10-29
Gap Fill Methods For Dram App 20200286897 - Panda; Priyadarshi ; et al.	2020-09-10
Low thickness dependent work-function nMOS integration for metal gate Grant 10,608,097 - Ma , et al.	2020-03-31
Method Of Forming Via With Embedded Barrier App 20200090991 - Yu; Sang Ho ; et al.	2020-03-19
Oxygen Free Deposition Of Platinum Group Metal Films App 20200063263 - Yang; Yixiong ; et al.	2020-02-27
Catalyzed Deposition Of Metal Films App 20190390340 - Yu; Sang Ho ; et al.	2019-12-26
Synthesis of metal nitride thin films materials using hydrazine derivatives Grant 10,487,398 - Yoon , et al. Nov	2019-11-26
Selective Deposition Of Aluminum Oxide On Metal Surfaces App 20190338417 - Yu; Sang Ho ; et al.	2019-11-07
Barrier for Copper Metallization and Methods of Forming App 20190341304 - Ganguli; Seshadri ; et al.	2019-11-07
Selective deposition of aluminum oxide on metal surfaces Grant 10,358,719 - Yu , et al. July 23, 2	2019-07-23
Methods for selective deposition of metal silicides via atomic layer deposition cycles Grant 10,199,230 - Ganguli , et al. Fe	2019-02-05
Low Thickness Dependent Work-Function nMOS Integration For Metal Gate App 20190019874 - Ma; Paul F. ; et al.	2019-01-17
Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD) Grant 10,109,534 - Brand , et al. October 23, 2	2018-10-23
Synthesis of Metal Nitride Thin Films Materials using Hydrazine Derivatives App 20180155827 - Yoon; Byunghoon ; et al.	2018-06-07
Selective Deposition Of Aluminum Oxide On Metal Surfaces App 20180142348 - Yu; Sang Ho ; et al.	2018-05-24
Methods for forming barrier/seed layers for copper interconnect structures Grant 9,926,639 - Kim , et al. March 27, 2	2018-03-27
Selective Cobalt Deposition On Copper Surfaces App 20170321320 - YU; Sang-Ho ; et al.	2017-11-09
Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof Grant 9,748,354 - Tang , et al. August 29, 2	2017-08-29
Multi-threshold Voltage Structures With A Lanthanum Nitride Film And Methods Of Formation Thereof App 20170179252 - TANG; Wei V. ; et al.	2017-06-22
Deposition of films comprising aluminum alloys with high aluminum content Grant 9,683,287 - Thompson , et al. June 20, 2	2017-06-20
Methods for etching via atomic layer deposition (ALD) cycles Grant 9,595,466 - Fu , et al. March 14, 2	2017-03-14
Method for cleaning titanium alloy deposition Grant 9,530,627 - Gandikota , et al. December 27, 2	2016-12-27
Film deposition using spatial atomic layer deposition or pulsed chemical vapor deposition Grant 9,514,933 - Lei , et al. December 6, 2	2016-12-06
Methods For Selective Deposition Of Metal Silicides Via Atomic Layer Deposition Cycles App 20160322229 - GANGULI; Seshadri ; et al.	2016-11-03
Methods For Etching Via Atomic Layer Deposition (ald) Cycles App 20160276214 - FU; Xinyu ; et al.	2016-09-22
N-metal film deposition with initiation layer Grant 9,269,584 - Ganguli , et al. February 23, 2	2016-02-23
Integrated platform for fabricating n-type metal oxide semiconductor (NMOS) devices Grant 9,230,835 - Gelatos , et al. January 5, 2	2016-01-05
Cobalt deposition on barrier surfaces Grant 9,209,074 - Lu , et al. December 8, 2	2015-12-08
Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements Grant 9,202,674 - Cuvalci , et al. December 1, 2	2015-12-01
Selective Cobalt Deposition On Copper Surfaces App 20150325446 - YU; Sang-Ho ; et al.	2015-11-12
Deposition of N-metal films comprising aluminum alloys Grant 9,145,612 - Gandikota , et al. September 29, 2	2015-09-29
MULTI-THRESHOLD VOLTAGE (Vt) WORKFUNCTION METAL BY SELECTIVE ATOMIC LAYER DEPOSITION (ALD) App 20150262828 - BRAND; ADAM ; et al.	2015-09-17
Cobalt Deposition On Barrier Surfaces App 20150255333 - LU; Jiang ; et al.	2015-09-10
Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performance Grant 9,129,945 - Lee , et al. September 8, 2	2015-09-08
Film Deposition Using Spatial Atomic Layer Deposition Or Pulsed Chemical Vapor Deposition App 20150194298 - Lei; Yu ; et al.	2015-07-09
Cobalt deposition on barrier surfaces Grant 9,051,641 - Lu , et al. June 9, 2	2015-06-09
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors Grant 9,048,183 - Ganguli , et al. June 2, 2	2015-06-02
Apparatus and process for plasma-enhanced atomic layer deposition Grant 9,032,906 - Ma , et al. May 19, 2	2015-05-19
Method For Cleaning Titanium Alloy Deposition App 20150086722 - GANDIKOTA; Srinivas ; et al.	2015-03-26
Methods for manufacturing metal gates Grant 8,987,080 - Lu , et al. March 24, 2	2015-03-24
Ampoule with a thermally conductive coating Grant 8,951,478 - Chu , et al. February 10, 2	2015-02-10
Deposition of metal films using alane-based precursors Grant 8,927,059 - Lu , et al. January 6, 2	2015-01-06
N-metal film deposition with initiation layer Grant 8,895,443 - Ganguli , et al. November 25, 2	2014-11-25
Integrated Platform For Fabricating N-type Metal Oxide Semiconductor (nmos) Devices App 20140273515 - GELATOS; AVGERINOS V. ; et al.	2014-09-18
Process for forming cobalt-containing materials Grant 8,815,724 - Ganguli , et al. August 26, 2	2014-08-26
Post deposition treatments for CVD cobalt films Grant 8,765,601 - Lei , et al. July 1, 2	2014-07-01
Nmos Metal Gate Materials, Manufacturing Methods, And Equipment Using Cvd And Ald Processes With Metal Based Precursors App 20140120712 - GANGULI; Seshadri ; et al.	2014-05-01
Deposition Of Films Comprising Aluminum Alloys With High Aluminum Content App 20140112824 - Thompson; David ; et al.	2014-04-24
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors Grant 8,642,468 - Ganguli , et al. February 4, 2	2014-02-04
Metal gate structures and methods for forming thereof Grant 8,637,390 - Ganguli , et al. January 28, 2	2014-01-28
Method for metal deposition using hydrogen plasma Grant 8,637,410 - Subramani , et al. January 28, 2	2014-01-28
Deposition Of N-Metal Films Comprising Aluminum Alloys App 20140017408 - Gandikota; Srinivas ; et al.	2014-01-16
Post Deposition Treatments For Cvd Cobalt Films App 20140011354 - LEI; Yu ; et al.	2014-01-09
Doping aluminum in tantalum silicide Grant 8,592,305 - Lu , et al. November 26, 2	2013-11-26
Methods For Manufacturing Metal Gates App 20130295759 - Lu; Xinliang ; et al.	2013-11-07
Process for forming cobalt and cobalt silicide materials in tungsten contact applications Grant 8,563,424 - Ganguli , et al. October 22, 2	2013-10-22
Post deposition treatments for CVD cobalt films Grant 8,524,600 - Lei , et al. September 3, 2	2013-09-03
Chemical Vapor Deposition (cvd) Of Ruthenium Films And Applications For Same App 20130146468 - KIM; HOON ; et al.	2013-06-13
Doping aluminum in tantalum silicide App 20130122697 - Lu; Xinliang ; et al.	2013-05-16
Deposition Of Metal Films Using Alane-based Precursors App 20130115383 - Lu; Xinliang ; et al.	2013-05-09
N-Metal Film Deposition With Initiation Layer App 20120322262 - Ganguli; Seshadri ; et al.	2012-12-20
N-Metal Film Deposition With Initiation Layer App 20120322250 - Ganguli; Seshadri ; et al.	2012-12-20
Process For Forming Cobalt-containing Materials App 20120264291 - Ganguli; Seshadri ; et al.	2012-10-18
Method for Metal Deposition Using Hydrogen Plasma App 20120258602 - Subramani; Anantha K. ; et al.	2012-10-11
Post Deposition Treatments For Cvd Cobalt Films App 20120252207 - Lei; Yu ; et al.	2012-10-04
Process For Forming Cobalt And Cobalt Silicide Materials In Tungsten Contact Applications App 20120214303 - GANGULI; SESHADRI ; et al.	2012-08-23
Methods For Forming Barrier/seed Layers For Copper Interconnect Structures App 20120141667 - KIM; HOON ; et al.	2012-06-07
Process for forming cobalt and cobalt silicide materials in tungsten contact applications Grant 8,187,970 - Ganguli , et al. May 29, 2	2012-05-29
Process for forming cobalt-containing materials Grant 8,110,489 - Ganguli , et al. February 7, 2	2012-02-07
Methods For Forming Barrier/seed Layers For Copper Interconnect Structures App 20120012465 - KIM; HOON ; et al.	2012-01-19
Chemical Vapor Deposition Of Ruthenium Films Containing Oxygen Or Carbon App 20110312148 - KIM; HOON ; et al.	2011-12-22
Metal Gate Structures And Methods For Forming Thereof App 20110298062 - GANGULI; SESHADRI ; et al.	2011-12-08
Method and apparatus for generating a precursor for a semiconductor processing system Grant 8,062,422 - Chen , et al. November 22, 2	2011-11-22
Nmos Metal Gate Materials, Manufacturing Methods, And Equipment Using Cvd And Ald Processes With Metal Based Precursors App 20110263115 - Ganguli; Seshadri ; et al.	2011-10-27
Formation Of Liner And Barrier For Tungsten As Gate Electrode And As Contact Plug To Reduce Resistance And Enhance Device Performance App 20110233778 - Lee; Sang-Hyeob ; et al.	2011-09-29
Process For Forming Cobalt-containing Materials App 20110124192 - Ganguli; Seshadri ; et al.	2011-05-26
Process For Forming Cobalt And Cobalt Silicide Materials In Tungsten Contact Applications App 20110086509 - GANGULI; SESHADRI ; et al.	2011-04-14
Ruthenium layer formation for copper film deposition Grant 7,910,165 - Ganguli , et al. March 22, 2	2011-03-22
Apparatus and process for plasma-enhanced atomic layer deposition Grant 7,850,779 - Ma , et al. December 14, 2	2010-12-14
Method of recovering valuable material from exhaust gas stream of a reaction chamber Grant 7,833,358 - Chu , et al. November 16, 2	2010-11-16
Chemical delivery apparatus for CVD or ALD Grant 7,832,432 - Nakashima , et al. November 16, 2	2010-11-16
Chemical delivery apparatus for CVD or ALD Grant 7,748,400 - Nakashima , et al. July 6, 2	2010-07-06
Vapor Deposition Method For Ternary Compounds App 20100102417 - Ganguli; Seshadri ; et al.	2010-04-29
Plasma Reactor With A Ceiling Electrode Supply Conduit Having A Succession Of Voltage Drop Elements App 20100096085 - CUVALCI; OLKAN ; et al.	2010-04-22
Ruthenium or cobalt as an underlayer for tungsten film deposition Grant 7,691,442 - Gandikota , et al. April 6, 2	2010-04-06
Apparatus and process for plasma-enhanced atomic layer deposition Grant 7,682,946 - Ma , et al. March 23, 2	2010-03-23
Method for providing gas to a processing chamber Grant 7,678,194 - Ganguli , et al. March 16, 2	2010-03-16
Chemical Delivery Apparatus For Cvd Or Ald App 20100006167 - Nakashima; Norman ; et al.	2010-01-14
Chemical Delivery Apparatus For Cvd Or Ald App 20090314370 - Nakashima; Norman ; et al.	2009-12-24
Selective Cobalt Deposition On Copper Surfaces App 20090269507 - Yu; Sang-Ho ; et al.	2009-10-29
Chemical precursor ampoule for vapor deposition processes Grant 7,597,758 - Chen , et al. October 6, 2	2009-10-06
Apparatus and method for generating a chemical precursor Grant 7,588,736 - Chen , et al. September 15, 2	2009-09-15
Multi-step barrier deposition method Grant 7,576,002 - Chen , et al. August 18, 2	2009-08-18
Chemical delivery apparatus for CVD or ALD Grant 7,568,495 - Nakashima , et al. August 4, 2	2009-08-04
Method and apparatus for providing precursor gas to a processing chamber Grant 7,569,191 - Ganguli , et al. August 4, 2	2009-08-04
Chemical delivery apparatus for CVD or ALD Grant 7,562,672 - Nakashima , et al. July 21, 2	2009-07-21
Method And Apparatus For Generating A Precursor For A Semiconductor Processing System App 20090151633 - Chen; Ling ; et al.	2009-06-18
Ruthenium As An Underlayer For Tungsten Film Deposition App 20090142474 - Gandikota; Srinivas ; et al.	2009-06-04
Method and apparatus for generating a precursor for a semiconductor processing system Grant 7,524,374 - Chen , et al. April 28, 2	2009-04-28
Cobalt Deposition On Barrier Surfaces App 20090053426 - LU; JIANG ; et al.	2009-02-26
Method And Apparatus For Providing Precursor Gas To A Processing Chamber App 20090011129 - Ganguli; Seshadri ; et al.	2009-01-08
Process For Forming Cobalt And Cobalt Silicide Materials In Tungsten Contact Applications App 20090004850 - GANGULI; SESHADRI ; et al.	2009-01-01
Process For Forming Cobalt And Cobalt Silicide Materials In Copper Contact Applications App 20080268635 - Yu; Sang-Ho ; et al.	2008-10-30
Apparatus And Process For Plasma-enhanced Atomic Layer Deposition App 20080268171 - MA; PAUL ; et al.	2008-10-30
Ruthenium as an underlayer for tungsten film deposition Grant 7,429,402 - Gandikota , et al. September 30, 2	2008-09-30
Method and apparatus for providing precursor gas to a processing chamber Grant 7,429,361 - Ganguli , et al. September 30, 2	2008-09-30
Chemical Precursor Ampoule For Vapor Deposition Processes App 20080216743 - CHEN; LING ; et al.	2008-09-11
Ampoule With A Thermally Conductive Coating App 20080149031 - CHU; SCHUBERT S. ; et al.	2008-06-26
Rate Control Process For A Precursor Delivery System App 20080044573 - CHEN; LING ; et al.	2008-02-21
Chemical Delivery Apparatus For Cvd Or Ald App 20080041311 - Nakashima; Norman ; et al.	2008-02-21
Method of recovering valuable material from exhaust gas stream of a reaction chamber App 20070235059 - Chu; Schubert S. ; et al.	2007-10-11
Chemical delivery apparatus for CVD or ALD App 20070235085 - Nakashima; Norman ; et al.	2007-10-11
Method and apparatus of generating PDMAT precursor Grant 7,270,709 - Chen , et al. September 18, 2	2007-09-18
Reduction of copper dewetting by transition metal deposition Grant 7,265,048 - Chung , et al. September 4, 2	2007-09-04
Ruthenium layer formation for copper film deposition Grant 7,264,846 - Chang , et al. September 4, 2	2007-09-04
Process For Forming Cobalt-containing Materials App 20070202254 - GANGULI; SESHADRI ; et al.	2007-08-30
Apparatus And Process For Plasma-enhanced Atomic Layer Deposition App 20070128864 - MA; PAUL ; et al.	2007-06-07
Apparatus And Process For Plasma-enhanced Atomic Layer Deposition App 20070128862 - Ma; Paul ; et al.	2007-06-07
Apparatus And Process For Plasma-enhanced Atomic Layer Deposition App 20070128863 - Ma; Paul ; et al.	2007-06-07
Apparatus And Process For Plasma-enhanced Atomic Layer Deposition App 20070119370 - MA; PAUL ; et al.	2007-05-31
Apparatus And Process For Plasma-enhanced Atomic Layer Deposition App 20070119371 - MA; PAUL ; et al.	2007-05-31
Method And Apparatus For Providing Precursor Gas To A Processing Chamber App 20070110898 - Ganguli; Seshadri ; et al.	2007-05-17
Method For Providing Gas To A Processing Chamber App 20070089817 - Ganguli; Seshadri ; et al.	2007-04-26
Atomic Layer Deposition Processes For Ruthenium Materials App 20070077750 - Ma; Paul ; et al.	2007-04-05
Method and apparatus for generating a precursor for a semiconductor processing system App 20070067609 - Chen; Ling ; et al.	2007-03-22
Atomic Layer Deposition Processes For Ruthenium Materials App 20070054487 - MA; PAUL ; et al.	2007-03-08
Apparatus for providing gas to a processing chamber Grant 7,186,385 - Ganguli , et al. March 6, 2	2007-03-06
Apparatus And Method For Generating A Chemical Precursor App 20060257295 - Chen; Ling ; et al.	2006-11-16
Reduction of copper dewetting by transition metal deposition App 20060199372 - Chung; Hua ; et al.	2006-09-07
Ruthenium layer formation for copper film deposition App 20060153973 - Chang; Mei ; et al.	2006-07-13
Ruthenium as an underlayer for tungsten film deposition App 20060128150 - Gandikota; Srinivas ; et al.	2006-06-15
Multi-step barrier deposition method App 20050255690 - Chen, Ling ; et al.	2005-11-17
Tantalum barrier layer for copper metallization Grant 6,953,742 - Chen , et al. October 11, 2	2005-10-11
Method and apparatus of generating PDMAT precursor App 20050189072 - Chen, Ling ; et al.	2005-09-01
Method and apparatus of generating PDMAT precursor Grant 6,905,541 - Chen , et al. June 14, 2	2005-06-14
Precursor delivery system with rate control App 20050095859 - Chen, Ling ; et al.	2005-05-05
Tantalum barrier layer for copper metallization App 20050074968 - Chen, Ling ; et al.	2005-04-07
Deposition of tungsten nitride using plasma pretreatment in a chemical vapor deposition chamber Grant 6,872,429 - Chen , et al. March 29, 2	2005-03-29
Ruthenium layer formation for copper film deposition App 20040241321 - Ganguli, Seshadri ; et al.	2004-12-02
Method and apparatus for monitoring solid precursor delivery Grant 6,772,072 - Ganguli , et al. August 3, 2	2004-08-03
Ruthenium layer formation for copper film deposition App 20040105934 - Chang, Mei ; et al.	2004-06-03
Method and apparatus for monitoring solid precursor delivery App 20040015300 - Ganguli, Seshadri ; et al.	2004-01-22
Method and apparatus for providing gas to a processing chamber App 20040013577 - Ganguli, Seshadri ; et al.	2004-01-22
Method and apparatus of generating PDMAT precursor App 20040014320 - Chen, Ling ; et al.	2004-01-22
Process for removing an underlying layer and depositing a barrier layer in one reactor Grant 6,660,622 - Chen , et al. December 9, 2	2003-12-09
Atomic layer deposition of tungsten barrier layers using tungsten carbonyls and boranes for copper metallization App 20030203616 - Chung, Hua ; et al.	2003-10-30
Copper interconnect barrier layer structure and formation method Grant 6,607,976 - Chen , et al. August 19, 2	2003-08-19
Apparatus and method for low pressure CVD deposition of tungsten and tungsten nitride App 20030140857 - Umotoy, Salvador P. ; et al.	2003-07-31
Process for removing an underlying layer and depositing a barrier layer in one reactor App 20030087520 - Chen, Ling ; et al.	2003-05-08
Copper interconnect barrier layer structure and formation method App 20030059980 - Chen, Ling ; et al.	2003-03-27
Chemical vapor deposition chamber App 20030019428 - Ku, Vincent W. ; et al.	2003-01-30
Low-resistivity tungsten from high-pressure chemical vapor deposition using metal-organic precursor App 20030008070 - Seutter, Sean Michael ; et al.	2003-01-09
Method of using a barrier sputter reactor to remove an underlying barrier layer Grant 6,498,091 - Chen , et al. December 24, 2	2002-12-24
W-CVD with fluorine-free tungsten nucleation App 20020190379 - Jian, Ping ; et al.	2002-12-19
Integrated barrier layer structure for copper contact level metallization App 20020192948 - Chen, Fusen ; et al.	2002-12-19
CVD method of depositing copper films by using improved organocopper precursor blend Grant 6,110,530 - Chen , et al. August 29, 2	2000-08-29

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