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Patent applications and USPTO patent grants for Gallagher; Emily.The latest application filed is for "method for forming an extreme ultraviolet lithography pellicle".
Patent | Date |
---|---|
Extreme ultraviolet lithography device Grant 11,360,380 - Franke , et al. June 14, 2 | 2022-06-14 |
Lithography scanner Grant 11,181,818 - Gallagher , et al. November 23, 2 | 2021-11-23 |
Induced stress for EUV pellicle tensioning Grant 11,163,229 - Mariano Juste , et al. November 2, 2 | 2021-11-02 |
Method for forming a pellicle Grant 11,092,886 - Timmermans , et al. August 17, 2 | 2021-08-17 |
Method for Forming an Extreme Ultraviolet Lithography Pellicle App 20210191255 - Timmermans; Marina ;   et al. | 2021-06-24 |
Extreme Ultraviolet Lithography Device App 20210011370 - Franke; Joern-Holger ;   et al. | 2021-01-14 |
Method for manufacturing a mask Grant 10,720,336 - Gallagher , et al. | 2020-07-21 |
Method for forming a carbon nanotube pellicle membrane Grant 10,712,659 - Gallagher , et al. | 2020-07-14 |
Lithography Scanner App 20200209737 - Gallagher; Emily ;   et al. | 2020-07-02 |
Induced Stress for EUV Pellicle Tensioning App 20200201169 - Mariano Juste; Marina ;   et al. | 2020-06-25 |
Lithographic reticle system Grant 10,353,284 - Jonckheere , et al. July 16, 2 | 2019-07-16 |
Method for Manufacturing a Mask App 20190074186 - Gallagher; Emily ;   et al. | 2019-03-07 |
Method for Forming a Carbon Nanotube Pellicle Membrane App 20180329289 - Gallagher; Emily ;   et al. | 2018-11-15 |
Method for Forming a Pellicle App 20180329291 - Timmermans; Marina ;   et al. | 2018-11-15 |
Lithographic Reticle System App 20180329290 - Jonckheere; Rik ;   et al. | 2018-11-15 |
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