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name:-0.00049877166748047
Gabriel; Calvin Todd Patent Filings

Gabriel; Calvin Todd

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gabriel; Calvin Todd.The latest application filed is for "optimized gate implants for reducing dopant effects during gate etching".

Company Profile
0.16.2
  • Gabriel; Calvin Todd - Cupertino CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Optimized gate implants for reducing dopant effects during gate etching
Grant 6,822,291 - Gabriel , et al. November 23, 2
2004-11-23
Etch process that resists notching at electrode bottom
Grant 6,794,294 - Zheng , et al. September 21, 2
2004-09-21
Semiconductor blocking layer for preventing UV radiation damage to MOS gate oxides
Grant 6,627,536 - Gabriel September 30, 2
2003-09-30
Optimized gate implants for reducing dopant effects during gate etching
App 20030146472 - Gabriel, Calvin Todd ;   et al.
2003-08-07
Methods for forming co-axial interconnect lines in a CMOS process for high speed applications
Grant 6,569,757 - Weling , et al. May 27, 2
2003-05-27
Methods for implementing co-axial interconnect lines in a CMOS process for high speed RF and microwave applications
Grant 6,545,338 - Bothra , et al. April 8, 2
2003-04-08
Semiconductor blocking layer for preventing UV radiation damage to MOS gate oxides
Grant 6,410,210 - Gabriel June 25, 2
2002-06-25
Method for reducing the amount of perfluorocompound gas contained in exhaust emissions from plasma processing
Grant 6,361,706 - Gabriel March 26, 2
2002-03-26
Method for a consistent shallow trench etch profile
Grant 6,342,428 - Zheng , et al. January 29, 2
2002-01-29
Sacrificial multilayer anti-reflective coating for mos gate formation
Grant 6,297,170 - Gabriel , et al. October 2, 2
2001-10-02
Optimized metal etch process to enable the use of aluminum plugs
App 20010012690 - Zheng, Tammy ;   et al.
2001-08-09
Optimized metal etch process to enable the use of aluminum plugs
Grant 6,255,226 - Zheng , et al. July 3, 2
2001-07-03
Method of manufacturing a trench structure in a semiconductor substrate
Grant 6,107,158 - Zheng , et al. August 22, 2
2000-08-22
Silicon-enriched shallow trench oxide for reduced recess during LDD spacer etch
Grant 6,013,558 - Harvey , et al. January 11, 2
2000-01-11
Sidewall profile
Grant 5,939,765 - Zheng , et al. August 17, 1
1999-08-17
Trench isolation method
Grant 5,882,982 - Zheng , et al. March 16, 1
1999-03-16
Method for achieving accurate SOG etchback selectivity
Grant 5,821,163 - Harvey , et al. October 13, 1
1998-10-13
Method for forming a reduced width gate electrode
Grant 5,776,821 - Haskell , et al. July 7, 1
1998-07-07

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