FURUYA; Haruhiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for FURUYA; Haruhiko.The latest application filed is for "plasma processing apparatus and plasma processing method".

Company Profile

0.9.13

FURUYA; Haruhiko - Yamanashi JP
FURUYA; Haruhiko - Nirasaki City JP
Furuya; Haruhiko - Nirasaki JP
FURUYA; Haruhiko - Nirasaki-shi JP
Furuya; Haruhiko - Tokyo JP
Furuya; Haruhiko - Tokyo-To JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma Processing Apparatus And Plasma Processing Method App 20220068606 - KAMATA; Eiki ; et al.	2022-03-03
Substrate processing apparatus and film deposition apparatus Grant 9,136,156 - Enomoto , et al. September 15, 2	2015-09-15
Gas Supply Method And Thermal Treatment Method App 20150221529 - FURUYA; Haruhiko ; et al.	2015-08-06
Raw material supplying device and film forming apparatus Grant 9,080,238 - Wamura , et al. July 14, 2	2015-07-14
Apparatus and method of forming thin film including adsorption step and reaction step Grant 8,778,812 - Furuya , et al. July 15, 2	2014-07-15
Film formation method for forming hafnium oxide film Grant 8,586,140 - Furuya November 19, 2	2013-11-19
Film Deposition Method App 20130164945 - FURUYA; Haruhiko ; et al.	2013-06-27
Substrate Processing Apparatus And Film Deposition Apparatus App 20130061804 - ENOMOTO; Tadashi ; et al.	2013-03-14
Gas Supply Apparatus, Thermal Treatment Apparatus, Gas Supply Method, And Thermal Treatment Method App 20120288625 - FURUYA; Haruhiko ; et al.	2012-11-15
Raw Material Supplying Device And Film Forming Apparatus App 20120160172 - WAMURA; Yu ; et al.	2012-06-28
Film Formation Method For Forming Hafnium Oxide Film App 20110268872 - FURUYA; Haruhiko	2011-11-03
Vertical Heat Processing Apparatus And Component For Same, For Forming High Dielectric Constant Film App 20100186667 - ISHII; Katsutoshi ; et al.	2010-07-29
Formation of metal oxide film App 20080226820 - Furuya; Haruhiko	2008-09-18
Film formation apparatus and method of using the same Grant 7,368,384 - Endo , et al. May 6, 2	2008-05-06
Film forming method for depositing a plurality of high-k dielectric films Grant 7,041,546 - Morozumi , et al. May 9, 2	2006-05-09
Semiconductor processing method for processing substrate to be processed and its apparatus App 20050272271 - Furuya, Haruhiko ; et al.	2005-12-08
Film formation apparatus and method of using the same App 20050245099 - Endo, Atsushi ; et al.	2005-11-03
Capacitor structure and film forming method and apparatus App 20040195653 - Morozumi, Yuichiro ; et al.	2004-10-07

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