FURUTANI; Hajime

Patent Applications and Registrations

Patent applications and USPTO patent grants for FURUTANI; Hajime.The latest application filed is for "photosensitive composition for euv light, pattern forming method, and method for manufacturing electronic device".

Company Profile

8.2.13

FURUTANI; Hajime - Shizuoka JP
Furutani; Hajime - Haibara-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive Composition For Euv Light, Pattern Forming Method, And Method For Manufacturing Electronic Device App 20210011377 - SHIRAKAWA; Michihiro ; et al.	2021-01-14
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, Mask Blank With Resist Film, Method For Producing Photomask, And Method For Manufacturing Electronic Device App 20200319551 - Tsuchimura; Tomotaka ; et al.	2020-10-08
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, And Method For Manufacturin App 20200192220 - YAGI; Kazunari ; et al.	2020-06-18
Photosensitive Composition For Euv Light, Pattern Forming Method, And Method For Manufacturing Electronic Device App 20200050106 - SHIRAKAWA; Michihiro ; et al.	2020-02-13
Resist Composition, Pattern Forming Method, And Method Of Manufacturing Electronic Device App 20190219922 - KANEKO; Akihiro ; et al.	2019-07-18
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Pattern Forming Method, And Method Of Manufacturing Electronic D App 20190219921 - TSUBAKI; Hideaki ; et al.	2019-07-18
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Pattern Forming Method, And Method Of Manufacturing Electronic D App 20190187558 - NIHASHI; Wataru ; et al.	2019-06-20
Pattern forming method, treating agent, electronic device, and method for manufacturing the same Grant 10,303,058 - Furutani , et al.	2019-05-28
Pattern Forming Method, Active Light Sensitive Or Radiation Sensitive Resin Composition, Active Light Sensitive Or Radiation Sensitive Film, Method For Manufacturing Electronic Device, And Electronic Device App 20170059995 - FURUTANI; Hajime ; et al.	2017-03-02
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound Grant 9,523,912 - Kataoka , et al. December 20, 2	2016-12-20
Pattern Forming Method, Treating Agent, Electronic Device, And Method For Manufacturing The Same App 20160327866 - FURUTANI; Hajime ; et al.	2016-11-10
Pattern Formation Method, Electronic-device Production Method, And Processing Agent App 20160195814 - ENOMOTO; Yuichiro ; et al.	2016-07-07
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device, Electronic Device And Compound App 20160070167 - KATAOKA; Shohei ; et al.	2016-03-10
Pattern-forming Method, Electronic Device And Method For Producing Same, And Developing Fluid App 20160048082 - KOJIMA; Masafumi ; et al.	2016-02-18
Pattern Forming Method, Compound Used Therein, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Manufacturing Method Of Electronic Device, And Electronic Device App 20150331314 - YAMAGUCHI; Shuhei ; et al.	2015-11-19

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