Furuta; Gaku
Patent Applications and Registrations
Patent applications and USPTO patent grants for Furuta; Gaku.The latest application filed is for "heat conductive spacer for plasma processing chamber".
Company Profile
10.40.50
- Furuta; Gaku - Sunnyvale CA
- Furuta; Gaku - Osaka JP
- Furuta; Gaku - San Jose CA
Patent Activity
| Patent | Date |
|---|---|
| Method of removal of sharp corners from diffuser plate Grant 11,123,837 - Hong , et al. September 21, 2 | 2021-09-21 |
| Chamber liner Grant 10,923,327 - Li , et al. February 16, 2 | 2021-02-16 |
| Corner spoiler for improving profile uniformity Grant 10,697,063 - Zhao , et al. | 2020-06-30 |
| Flip edge shadow frame Grant 10,676,817 - Wang , et al. | 2020-06-09 |
| Heat Conductive Spacer For Plasma Processing Chamber App 20200098549 - PARK; Beom Soo ; et al. | 2020-03-26 |
| Silicon nitride forming precursor control App 20200058497 - Won; Tae Kyung ; et al. | 2020-02-20 |
| Chamber Liner App 20200043706 - LI; Jianheng ; et al. | 2020-02-06 |
| Shadow frame with sides having a varied profile for improved deposition uniformity Grant 10,468,221 - Furuta , et al. No | 2019-11-05 |
| Method Of Removal Of Sharp Corners From Diffuser Plate App 20190193233 - HONG; Ilyoung ; et al. | 2019-06-27 |
| Shadow Frame With Sides Having A Varied Profile For Improved Deposition Uniformity App 20190096624 - FURUTA; Gaku ; et al. | 2019-03-28 |
| Diffuser For Uniformity Improvement In Display Pecvd Applications App 20180340257 - ACHARY; Umesha ; et al. | 2018-11-29 |
| Substrate support with quadrants Grant 10,123,379 - Tiner , et al. November 6, 2 | 2018-11-06 |
| Low temperature multilayer dielectric film for passivation and capacitor Grant 10,002,711 - Wang , et al. June 19, 2 | 2018-06-19 |
| Diffuser With Corner HCG App 20180090300 - ZHAO; Lai ; et al. | 2018-03-29 |
| Tightly fitted ceramic insulator on large area electrode Grant 9,827,578 - Kudela , et al. November 28, 2 | 2017-11-28 |
| Anodized showerhead Grant 9,758,869 - Choi , et al. September 12, 2 | 2017-09-12 |
| Substrate Support With Quadrants App 20170231033 - TINER; Robin L. ; et al. | 2017-08-10 |
| Gas Diffuser Having Grooved Hollow Cathodes App 20170178867 - KUDELA; Jozef ; et al. | 2017-06-22 |
| Substrate support with quadrants Grant 9,677,177 - Tiner , et al. June 13, 2 | 2017-06-13 |
| Methods For Forming A Silicon Containing Dielectric Film Using A Gas Mixture With Ar Gas Dilusion App 20170092492 - ZHAO; Lai ; et al. | 2017-03-30 |
| Ground Return For Plasma Processes App 20160305025 - CHOI; Soo Young ; et al. | 2016-10-20 |
| Low Temperature Multilayer Dielectric Film For Passivation And Capacitor App 20160240312 - WANG; Dapeng ; et al. | 2016-08-18 |
| Ground return for plasma processes Grant 9,382,621 - Choi , et al. July 5, 2 | 2016-07-05 |
| Run-to-run stability of film deposition Grant 9,299,558 - Zhao , et al. March 29, 2 | 2016-03-29 |
| Susceptor with roll-formed surface and method for making same Grant 9,243,328 - Furuta , et al. January 26, 2 | 2016-01-26 |
| A-Si seasoning effect to improve SiN run-to-run uniformity Grant 9,230,796 - Furuta , et al. January 5, 2 | 2016-01-05 |
| Substrate support with ceramic insulation Grant 9,187,827 - Furuta , et al. November 17, 2 | 2015-11-17 |
| Tightly Fitted Ceramic Insulator On Large Area Electrode App 20150273490 - KUDELA; Jozef ; et al. | 2015-10-01 |
| Run-to-run Stability Of Film Deposition App 20150270107 - ZHAO; Lai ; et al. | 2015-09-24 |
| Corner Spoiler For Improving Profile Uniformity App 20150211120 - ZHAO; Lai ; et al. | 2015-07-30 |
| Tightly fitted ceramic insulator on large area electrode Grant 9,068,262 - Kudela , et al. June 30, 2 | 2015-06-30 |
| A-si Seasoning Effect To Improve Sin Run-to-run Uniformity App 20150179426 - FURUTA; Gaku ; et al. | 2015-06-25 |
| Substrate Support With Quadrants App 20150114948 - TINER; Robin L. ; et al. | 2015-04-30 |
| a-Si seasoning effect to improve SiN run-to-run uniformity Grant 8,999,847 - Furuta , et al. April 7, 2 | 2015-04-07 |
| Susceptor with heater Grant D717,113 - Furuta , et al. November 11, 2 | 2014-11-11 |
| Plasma processing including asymmetrically grounding a susceptor Grant 8,877,301 - Furuta , et al. November 4, 2 | 2014-11-04 |
| Susceptor with heater Grant D716,098 - Furuta , et al. October 28, 2 | 2014-10-28 |
| Susceptor with heater Grant D713,200 - Furuta , et al. September 16, 2 | 2014-09-16 |
| Flip Edge Shadow Frame App 20140251216 - WANG; Qunhua ; et al. | 2014-09-11 |
| Flip Edge Shadow Frame App 20130263782 - WANG; QUNHUA ; et al. | 2013-10-10 |
| Substrate Support With Ceramic Insulation App 20130228124 - FURUTA; Gaku ; et al. | 2013-09-05 |
| Robust Outlet Plumbing For High Power Flow Remote Plasma Source App 20130140009 - White; John M. ; et al. | 2013-06-06 |
| Gas flow diffuser faceplate Grant D680,946 - Anwar , et al. April 30, 2 | 2013-04-30 |
| Thin film transistors having multiple doped silicon layers Grant 8,299,466 - Furuta , et al. October 30, 2 | 2012-10-30 |
| Flow blocking shadow frame support Grant D669,032 - Anwar , et al. October 16, 2 | 2012-10-16 |
| RF shutter Grant 8,281,739 - Tiner , et al. October 9, 2 | 2012-10-09 |
| A-si Seasoning Effect To Improve Sin Run-to-run Uniformity App 20120040536 - Furuta; Gaku ; et al. | 2012-02-16 |
| Tightly Fitted Ceramic Insulator On Large Area Electrode App 20110284100 - KUDELA; JOZEF ; et al. | 2011-11-24 |
| Thin Film Transistors Having Multiple Doped Silicon Layers App 20110269274 - Furuta; Gaku ; et al. | 2011-11-03 |
| Plasma processing including asymmetrically grounding a susceptor App 20110236599 - Furuta; Gaku ; et al. | 2011-09-29 |
| Differential etch rate control of layers deposited by chemical vapor deposition Grant 7,988,875 - Choi , et al. August 2, 2 | 2011-08-02 |
| Asymmetric grounding of rectangular susceptor Grant 7,972,470 - Furuta , et al. July 5, 2 | 2011-07-05 |
| Showerhead With Insulated Corner Regions App 20110146577 - ANWAR; SUHAIL ; et al. | 2011-06-23 |
| Susceptor with insulative inserts Grant 7,959,735 - Sterling , et al. June 14, 2 | 2011-06-14 |
| Method of cleaning a CVD processing chamber App 20110041873 - Furuta; Gaku ; et al. | 2011-02-24 |
| Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamber Grant 7,879,409 - Furuta , et al. February 1, 2 | 2011-02-01 |
| Anodized Showerhead App 20100288197 - Choi; Soo Young ; et al. | 2010-11-18 |
| Ground Return For Plasma Processes App 20100196626 - Choi; Soo Young ; et al. | 2010-08-05 |
| Method To Prevent Thin Spot In Large Size System App 20100151688 - Choi; Young Jin ; et al. | 2010-06-17 |
| Robust Outlet Plumbing For High Power Flow Remote Plasma Source App 20090283039 - WHITE; JOHN M. ; et al. | 2009-11-19 |
| Method To Prevent Parasitic Plasma Generation In Gas Feedthru Of Large Size Pecvd Chamber App 20090255798 - Furuta; Gaku ; et al. | 2009-10-15 |
| Plasma Processing Apparatus And Method App 20090258162 - FURUTA; GAKU ; et al. | 2009-10-15 |
| Susceptor With Roll-formed Surface And Method For Making Same App 20090238734 - Furuta; Gaku ; et al. | 2009-09-24 |
| Method And Apparatus For Controlling Plasma Uniformity App 20090197015 - Kudela; Jozef ; et al. | 2009-08-06 |
| Offset Liner For Chamber Evacuation App 20090107955 - TINER; ROBIN L. ; et al. | 2009-04-30 |
| Clean Rate Improvement By Pressure Controlled Remote Plasma Source App 20090023241 - Furuta; Gaku ; et al. | 2009-01-22 |
| Rf Shutter App 20080286463 - TINER; ROBIN L. ; et al. | 2008-11-20 |
| Asymmetric Grounding of Rectangular Susceptor App 20080274297 - FURUTA; Gaku ; et al. | 2008-11-06 |
| Differential Etch Rate Control Of Layers Deposited By Chemical Vapor Deposition App 20080190886 - Choi; Soo Young ; et al. | 2008-08-14 |
| Susceptor With Insulative Inserts App 20080194169 - Sterling; William N. ; et al. | 2008-08-14 |
| Gas Distribution Uniformity Improvement By Baffle Plate With Multi-size Holes For Large Size Pecvd Systems App 20080178807 - Wang; Qunhua ; et al. | 2008-07-31 |
| Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors Grant 7,125,758 - Choi , et al. October 24, 2 | 2006-10-24 |
| Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systems App 20060228490 - Wang; Qunhua ; et al. | 2006-10-12 |
| Deposition repeatability of PECVD films App 20060019031 - Furuta; Gaku ; et al. | 2006-01-26 |
| Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors App 20050233595 - Choi, Soo Young ; et al. | 2005-10-20 |
| System and method for etching adjoining layers of silicon and indium tin oxide Grant 6,623,653 - Furuta , et al. September 23, 2 | 2003-09-23 |
| System and method for etching adjoining layers of silicon and indium tin oxide App 20020185466 - Furuta, Gaku ; et al. | 2002-12-12 |
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