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name:-0.017017126083374
name:-0.015933990478516
name:-0.0015370845794678
FURUSAWA; Yoshikazu Patent Filings

FURUSAWA; Yoshikazu

Patent Applications and Registrations

Patent applications and USPTO patent grants for FURUSAWA; Yoshikazu.The latest application filed is for "shift drum angle detecting device for transmission".

Company Profile
1.15.14
  • FURUSAWA; Yoshikazu - TOKYO JP
  • Furusawa; Yoshikazu - Nirasaki JP
  • Furusawa; Yoshikazu - Yamanashi JP
  • FURUSAWA; Yoshikazu - Nirasaki City JP
  • Furusawa; Yoshikazu - Niraski JP
  • FURUSAWA; Yoshikazu - Niraski City JP
  • FURUSAWA; Yoshikazu - Nirasaki-shi JP
  • Furusawa; Yoshikazu - Tokyo-To JP
  • Furusawa, Yoshikazu - Yamanashi-Ken JP
  • Furusawa; Yoshikazu - Ibaraki Prefecture JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Shift Drum Angle Detecting Device For Transmission
App 20210095951 - ADACHI; Jun ;   et al.
2021-04-01
Substrate processing apparatus, injector, and substrate processing method
Grant 10,619,247 - Furusawa
2020-04-14
Film forming method and vertical thermal processing apparatus
Grant 10,573,518 - Furusawa Feb
2020-02-25
Film Forming Method and Vertical Thermal Processing Apparatus
App 20180286665 - FURUSAWA; Yoshikazu
2018-10-04
Substrate Processing Apparatus, Injector, And Substrate Processing Method
App 20180142357 - FURUSAWA; Yoshikazu
2018-05-24
Silicon film forming method, thin film forming method and cross-sectional shape control method
Grant 9,758,865 - Hasebe , et al. September 12, 2
2017-09-12
Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatus
Grant 9,540,743 - Takahashi , et al. January 10, 2
2017-01-10
Method of vapor-diffusing impurities
Grant 9,478,423 - Takahashi , et al. October 25, 2
2016-10-25
Amorphous Silicon Crystallizing Method, Crystallized Silicon Film Forming Method, Semiconductor Device Manufacturing Method and Film Forming Apparatus
App 20150159295 - TAKAHASHI; Kazuya ;   et al.
2015-06-11
Silicon Film Forming Method, Thin Film Forming Method and Cross-Sectional Shape Control Method
App 20150037970 - HASEBE; Kazuhide ;   et al.
2015-02-05
Impurity diffusion method, substrate processing apparatus, and method of manufacturing semiconductor device
Grant 8,906,792 - Takahashi , et al. December 9, 2
2014-12-09
Method Of Vapor-diffusing Impurities
App 20140030879 - TAKAHASHI; Kazuya ;   et al.
2014-01-30
Impurity Diffusion Method, Substrate Processing Apparatus, And Method Of Manufacturing Semiconductor Device
App 20130288470 - TAKAHASHI; Kazuya ;   et al.
2013-10-31
Method for using apparatus configured to form germanium-containing film
Grant 8,518,488 - Furusawa , et al. August 27, 2
2013-08-27
Method For Using Apparatus Configured To Form Germanium-containing Film
App 20100210094 - FURUSAWA; Yoshikazu ;   et al.
2010-08-19
Vertical CVD apparatus for forming silicon-germanium film
Grant 7,648,895 - Kurokawa , et al. January 19, 2
2010-01-19
Vertical Cvd Appparatus For Forming Silicon-germanium Film
App 20090104760 - KUROKAWA; Masaki ;   et al.
2009-04-23
Heat dissipation deterrence link for semiconductor manufacture
Grant D588,078 - Okada , et al. March 10, 2
2009-03-10
Heat dissipation deterrence link for semiconductor manufacture
Grant D588,079 - Okada , et al. March 10, 2
2009-03-10
Film formation method and apparatus for semiconductor process
Grant 7,273,818 - Kurokawa , et al. September 25, 2
2007-09-25
Method and apparatus for treating article to be treated
Grant 7,208,428 - Hishiya , et al. April 24, 2
2007-04-24
Oxide film forming method
Grant 7,064,084 - Hishiya , et al. June 20, 2
2006-06-20
Reduction in size of hemispherical grains of hemispherical grained film
App 20060021570 - Hasebe; Kazuhide ;   et al.
2006-02-02
Vertical CVD apparatus for forming silicon-germanium film
App 20050181586 - Kurokawa, Masaki ;   et al.
2005-08-18
Film formation method and apparatus for semiconductor process
App 20050170617 - Kurokawa, Masaki ;   et al.
2005-08-04
Method and apparatus for treating article to be treated
App 20040219793 - Hishiya, Shingo ;   et al.
2004-11-04
Oxide film forming method
App 20040087180 - Hishiya, Shingo ;   et al.
2004-05-06
Purification method of crude product
Grant 5,547,580 - Tsujii , et al. August 20, 1
1996-08-20

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