Patent | Date |
---|
Shift Drum Angle Detecting Device For Transmission App 20210095951 - ADACHI; Jun ;   et al. | 2021-04-01 |
Substrate processing apparatus, injector, and substrate processing method Grant 10,619,247 - Furusawa | 2020-04-14 |
Film forming method and vertical thermal processing apparatus Grant 10,573,518 - Furusawa Feb | 2020-02-25 |
Film Forming Method and Vertical Thermal Processing Apparatus App 20180286665 - FURUSAWA; Yoshikazu | 2018-10-04 |
Substrate Processing Apparatus, Injector, And Substrate Processing Method App 20180142357 - FURUSAWA; Yoshikazu | 2018-05-24 |
Silicon film forming method, thin film forming method and cross-sectional shape control method Grant 9,758,865 - Hasebe , et al. September 12, 2 | 2017-09-12 |
Amorphous silicon crystallizing method, crystallized silicon film forming method, semiconductor device manufacturing method and film forming apparatus Grant 9,540,743 - Takahashi , et al. January 10, 2 | 2017-01-10 |
Method of vapor-diffusing impurities Grant 9,478,423 - Takahashi , et al. October 25, 2 | 2016-10-25 |
Amorphous Silicon Crystallizing Method, Crystallized Silicon Film Forming Method, Semiconductor Device Manufacturing Method and Film Forming Apparatus App 20150159295 - TAKAHASHI; Kazuya ;   et al. | 2015-06-11 |
Silicon Film Forming Method, Thin Film Forming Method and Cross-Sectional Shape Control Method App 20150037970 - HASEBE; Kazuhide ;   et al. | 2015-02-05 |
Impurity diffusion method, substrate processing apparatus, and method of manufacturing semiconductor device Grant 8,906,792 - Takahashi , et al. December 9, 2 | 2014-12-09 |
Method Of Vapor-diffusing Impurities App 20140030879 - TAKAHASHI; Kazuya ;   et al. | 2014-01-30 |
Impurity Diffusion Method, Substrate Processing Apparatus, And Method Of Manufacturing Semiconductor Device App 20130288470 - TAKAHASHI; Kazuya ;   et al. | 2013-10-31 |
Method for using apparatus configured to form germanium-containing film Grant 8,518,488 - Furusawa , et al. August 27, 2 | 2013-08-27 |
Method For Using Apparatus Configured To Form Germanium-containing Film App 20100210094 - FURUSAWA; Yoshikazu ;   et al. | 2010-08-19 |
Vertical CVD apparatus for forming silicon-germanium film Grant 7,648,895 - Kurokawa , et al. January 19, 2 | 2010-01-19 |
Vertical Cvd Appparatus For Forming Silicon-germanium Film App 20090104760 - KUROKAWA; Masaki ;   et al. | 2009-04-23 |
Heat dissipation deterrence link for semiconductor manufacture Grant D588,078 - Okada , et al. March 10, 2 | 2009-03-10 |
Heat dissipation deterrence link for semiconductor manufacture Grant D588,079 - Okada , et al. March 10, 2 | 2009-03-10 |
Film formation method and apparatus for semiconductor process Grant 7,273,818 - Kurokawa , et al. September 25, 2 | 2007-09-25 |
Method and apparatus for treating article to be treated Grant 7,208,428 - Hishiya , et al. April 24, 2 | 2007-04-24 |
Oxide film forming method Grant 7,064,084 - Hishiya , et al. June 20, 2 | 2006-06-20 |
Reduction in size of hemispherical grains of hemispherical grained film App 20060021570 - Hasebe; Kazuhide ;   et al. | 2006-02-02 |
Vertical CVD apparatus for forming silicon-germanium film App 20050181586 - Kurokawa, Masaki ;   et al. | 2005-08-18 |
Film formation method and apparatus for semiconductor process App 20050170617 - Kurokawa, Masaki ;   et al. | 2005-08-04 |
Method and apparatus for treating article to be treated App 20040219793 - Hishiya, Shingo ;   et al. | 2004-11-04 |
Oxide film forming method App 20040087180 - Hishiya, Shingo ;   et al. | 2004-05-06 |
Purification method of crude product Grant 5,547,580 - Tsujii , et al. August 20, 1 | 1996-08-20 |