Furukawa; Toshihara
Patent Applications and Registrations
Patent applications and USPTO patent grants for Furukawa; Toshihara.The latest application filed is for "formation of ultra-thin oxide layers by self-limiting interfacial oxidation".
- Furukawa; Toshihara - Essex Junction VT
| Patent | Date |
|---|---|
| Formation of ultra-thin oxide layers by self-limiting interfacial oxidation Grant 7,235,440 - O'Meara , et al. June 26, 2 | 2007-06-26 |
| Method of forming uniform ultra-thin oxynitride layers Grant 7,202,186 - O'Meara , et al. April 10, 2 | 2007-04-10 |
| Method of forming uniform ultra-thin oxynitride layers App 20050026459 - O'Meara, David L. ; et al. | 2005-02-03 |
| Formation of ultra-thin oxide layers by self-limiting interfacial oxidation App 20050026453 - O'Meara, David L. ; et al. | 2005-02-03 |
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