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Chemically Amplified Positive Resist Composition And Resist Pattern Forming Process
App 20220308451 - Masunaga; Keiichi ; et al. | 2022-09-29 |
Negative Resist Composition And Pattern Forming Process
App 20220260909 - Hatakeyama; Jun ; et al. | 2022-08-18 |
Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film
Grant 10,816,900 - Urano , et al. October 27, 2 | 2020-10-27 |
Polymer, resist composition, and pattern forming process
Grant 10,457,761 - Hatakeyama , et al. Oc | 2019-10-29 |
Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film
Grant 10,203,601 - Urano , et al. Feb | 2019-02-12 |
Method for producing polymer
Grant 10,191,373 - Hatakeyama , et al. Ja | 2019-01-29 |
Tetracarboxylic Acid Diester Compound, Polymer Of Polyimide Precursor And Method For Producing Same, Negative Photosensitive Resin Composition, Patterning Process, And Method For Forming Cured Film
App 20190018320 - URANO; Hiroyuki ; et al. | 2019-01-17 |
Tetracarboxylic Acid Diester Compound, Polymer Of Polyimide Precursor And Method For Producing Same, Negative Photosensitive Resin Composition, Patterning Process, And Method For Forming Cured Film
App 20180120702 - URANO; Hiroyuki ; et al. | 2018-05-03 |
Positive resist composition and patterning process
Grant 9,778,568 - Funatsu , et al. October 3, 2 | 2017-10-03 |
Polymer, Resist Composition, And Pattern Forming Process
App 20170226250 - Hatakeyama; Jun ; et al. | 2017-08-10 |
Pattern forming process and shrink agent
Grant 9,618,850 - Hatakeyama , et al. April 11, 2 | 2017-04-11 |
Method For Producing Polymer
App 20170097567 - Hatakeyama; Jun ; et al. | 2017-04-06 |
Patterning process and resist composition
Grant 9,551,932 - Funatsu , et al. January 24, 2 | 2017-01-24 |
Postitive Resist Compostion And Patterning Process
App 20160327864 - Funatsu; Kenji ; et al. | 2016-11-10 |
Polymer, Resist Composition, And Pattern Forming Process
App 20160229940 - Hatakeyama; Jun ; et al. | 2016-08-11 |
Polymer, Resist Composition, And Pattern Forming Process
App 20160168296 - Hatakeyama; Jun ; et al. | 2016-06-16 |
Pattern Forming Process And Shrink Agent
App 20160124313 - Hatakeyama; Jun ; et al. | 2016-05-05 |
Resist composition and patterning process
Grant 9,250,523 - Hatakeyama , et al. February 2, 2 | 2016-02-02 |
Positive Resist Composition And Patterning Process
App 20150268555 - FUNATSU; Kenji ; et al. | 2015-09-24 |
Negative pattern forming process
Grant 9,091,933 - Kobayashi , et al. July 28, 2 | 2015-07-28 |
Resist composition and patterning process
Grant 9,086,625 - Hatakeyama , et al. July 21, 2 | 2015-07-21 |
Resist composition, patterning process and polymer
Grant 9,040,223 - Hatakeyama , et al. May 26, 2 | 2015-05-26 |
Positive resist composition and patterning process
Grant 8,871,427 - Taniguchi , et al. October 28, 2 | 2014-10-28 |
Patterning Process And Resist Composition
App 20140212808 - Funatsu; Kenji ; et al. | 2014-07-31 |
Resist Composition, Patterning Process And Polymer
App 20140178820 - Hatakeyama; Jun ; et al. | 2014-06-26 |
Resist Composition And Patterning Process
App 20140065544 - Hatakeyama; Jun ; et al. | 2014-03-06 |
Resist Composition And Patterning Process
App 20140065545 - Hatakeyama; Jun ; et al. | 2014-03-06 |
Patterning Process And Resist Composition
App 20140011136 - Hatakeyama; Jun ; et al. | 2014-01-09 |
Pattern forming process
Grant 8,623,590 - Hatakeyama , et al. January 7, 2 | 2014-01-07 |
Negative Pattern Forming Process
App 20130130183 - Kobayashi; Tomohiro ; et al. | 2013-05-23 |
Positive Resist Composition And Patterning Process
App 20130101936 - Taniguchi; Ryosuke ; et al. | 2013-04-25 |
Positive Resist Composition And Patterning Process
App 20130045444 - TANIGUCHI; Ryosuke ; et al. | 2013-02-21 |
Polymer, Positive Resist Composition, And Patterning Process
App 20120135357 - KOBAYASHI; Tomohiro ; et al. | 2012-05-31 |
Pattern Forming Process
App 20120108043 - Hatakeyama; Jun ; et al. | 2012-05-03 |
Resist Polymer, Preparing Method, Resist Composition And Patterning Process
App 20110054133 - Tachibana; Seiichiro ; et al. | 2011-03-03 |
Polymers, resist compositions and patterning process
Grant 7,718,342 - Funatsu , et al. May 18, 2 | 2010-05-18 |
Resist polymer, preparing method, resist composition and patterning process
App 20070264592 - Tachibana; Seiichiro ; et al. | 2007-11-15 |
Polymers, resist compositions and patterning process
App 20070148594 - Funatsu; Kenji ; et al. | 2007-06-28 |
Polymer, resist material and patterning processing
Grant 7,157,207 - Funatsu , et al. January 2, 2 | 2007-01-02 |
Resist polymer, resist composition and patterning process
Grant 7,135,270 - Watanabe , et al. November 14, 2 | 2006-11-14 |
Polymer, resist composition and patterning process
App 20050282083 - Funatsu, Kenji ; et al. | 2005-12-22 |
Polymer, resist material and patterning processing
App 20050089796 - Funatsu, Kenji ; et al. | 2005-04-28 |
Resist polymer, resist composition and patterning process
App 20050031989 - Watanabe, Takeru ; et al. | 2005-02-10 |
Resist polymer, resist composition and patterning process
App 20050031988 - Watanabe, Takeru ; et al. | 2005-02-10 |
Polymer, resist composition and patterning process
Grant 6,835,525 - Nishi , et al. December 28, 2 | 2004-12-28 |
Polymer, resist composition and patterning process
App 20020150835 - Nishi, Tsunehiro ; et al. | 2002-10-17 |
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