Funato; Satoru
Patent Applications and Registrations
Patent applications and USPTO patent grants for Funato; Satoru.The latest application filed is for "method for forming pattern and treating agent for use therein".
- Funato; Satoru - Shizuoka JP
- Funato; Satoru - Tokyo JP
- Funato, Satoru - Ogasa-gun JP
- Funato; Satoru - Saitama JP
- Funato; Satoru - Kawagoe JP
| Patent | Date |
|---|---|
| Development defect preventing process and material Grant 7,195,863 - Takano , et al. March 27, 2 | 2007-03-27 |
| Method for forming pattern and treating agent for use therein Grant 7,018,785 - Ono , et al. March 28, 2 | 2006-03-28 |
| Method for forming pattern and treating agent for use therein App 20040053170 - Ijima, Kazuyo ; et al. | 2004-03-18 |
| Process for preparing resists Grant 6,686,121 - Okazaki , et al. February 3, 2 | 2004-02-03 |
| Development deffect preventing process and material App 20030180667 - Takano, Yusuke ; et al. | 2003-09-25 |
| Chemically amplified resist composition Grant 6,479,210 - Kinoshita , et al. November 12, 2 | 2002-11-12 |
| Chemically Amplified Resist Composition App 20010036589 - KINOSHITA, YOSHIAKI ; et al. | 2001-11-01 |
| Novel process for preparing resists App 20010024765 - Okazaki, Hiroshi ; et al. | 2001-09-27 |
| Process for preparing resists Grant 6,284,427 - Okazaki , et al. September 4, 2 | 2001-09-04 |
| Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Grant 5,852,128 - Padmanaban , et al. December 22, 1 | 1998-12-22 |
| Organic nonlinear optical material Grant 5,383,050 - Yamamoto , et al. January 17, 1 | 1995-01-17 |
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