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Patent applications and USPTO patent grants for FULFORD, H. JIM JR..The latest application filed is for "ultrathin high-k gate dielectric with favorable interface properties for improved semiconductor device performance".
Patent | Date |
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Ultrathin High-k Gate Dielectric With Favorable Interface Properties For Improved Semiconductor Device Performance App 20030057432 - GARDNER, MARK I. ;   et al. | 2003-03-27 |
Igfet With Silicide Contact On Ultra-thin Gate App 20020003273 - DAWSON, ROBERT ;   et al. | 2002-01-10 |
Semiconductor Isolation Region Bounded By A Trench And Covered With An Oxide To Improve Planarization App 20010020727 - HAUSE, FRED N. ;   et al. | 2001-09-13 |
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