Fukuyama; Toshiaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fukuyama; Toshiaki.The latest application filed is for "silicon recycling method, and silicon and silicon ingot manufactured with that method".

Company Profile

0.4.5

Fukuyama; Toshiaki - Nara JP
Fukuyama; Toshiaki - Nara-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of purifying metal Grant 7,811,356 - Wada , et al. October 12, 2	2010-10-12
Method for purifying silicon and silicon Grant 7,625,541 - Fukuyama December 1, 2	2009-12-01
Silicon Recycling Method, And Silicon And Silicon Ingot Manufactured With That Method App 20090130014 - Fukuyama; Toshiaki ; et al.	2009-05-21
Method of Purifying Metal App 20080289150 - Wada; Kenji ; et al.	2008-11-27
Method For Refining Silicon And Silicon Refined Thereby App 20080031799 - Fukuyama; Toshiaki ; et al.	2008-02-07
Method for Purifying Silicon and Silicon App 20070297968 - Fukuyama; Toshiaki	2007-12-27
Silicon purifying method, slag for purifying silicon and purified silicon App 20050139148 - Fujiwara, Hiroyasu ; et al.	2005-06-30
Reflective type liquid crystal display apparatus having ESD protecting MIM beneath each reflective electrode Grant 5,719,647 - Fujikawa , et al. February 17, 1	1998-02-17
Two-terminal mim device having stable non-linearity characteristics and a lower electrode of thin TA film doped with nitrogen Grant 5,442,224 - Yoshimizu , et al. August 15, 1	1995-08-15

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