FUKASAWA; Masanaga

Patent Applications and Registrations

Patent applications and USPTO patent grants for FUKASAWA; Masanaga.The latest application filed is for "etching method for oxide semiconductor film".

Company Profile

3.18.22

FUKASAWA; Masanaga - Kanagawa JP
FUKASAWA; MASANAGA - TOKYO JP
Fukasawa; Masanaga - Fishkill NY US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching Method For Oxide Semiconductor Film App 20220122852 - HIRATA; Akiko ; et al.	2022-04-21
Semiconductor Device App 20210296384 - FUKASAWA; MASANAGA ; et al.	2021-09-23
Etching Method Of Oxide Semiconductor Film, Oxide Semiconductor Workpiece, And Electronic Device App 20210249273 - HIRATA; AKIKO ; et al.	2021-08-12
Solid-state Imaging Device And Method For Manufacturing The Same App 20210167106 - FUKASAWA; MASANAGA	2021-06-03
Etching method and etching processing apparatus Grant 11,017,987 - Fukasawa May 25, 2	2021-05-25
Etching Method And Etching Processing Apparatus App 20200373135 - FUKASAWA; MASANAGA	2020-11-26
Semiconductor device and solid-state imaging device Grant 10,804,313 - Kagawa , et al. October 13, 2	2020-10-13
Semiconductor device and manufacturing method of the same Grant 10,504,839 - Fukasawa Dec	2019-12-10
Semiconductor Device And Manufacturing Method Of The Same App 20190080997 - Fukasawa; Masanaga	2019-03-14
Semiconductor device and manufacturing method of the same Grant 10,157,837 - Fukasawa Dec	2018-12-18
Semiconductor Device And Solid-state Imaging Device App 20180286911 - KAGAWA; Yoshihisa ; et al.	2018-10-04
Semiconductor device and solid-state imaging device Grant 10,026,769 - Kagawa , et al. July 17, 2	2018-07-17
Semiconductor Device And Manufacturing Method Of The Same App 20180076126 - Fukasawa; Masanaga	2018-03-15
Semiconductor device and manufacturing method of the same Grant 9,859,214 - Fukasawa January 2, 2	2018-01-02
Semiconductor Device And Manufacturing Method Of The Same App 20170207163 - Fukasawa; Masanaga	2017-07-20
Semiconductor device and manufacturing method of the same Grant 9,627,359 - Fukasawa April 18, 2	2017-04-18
Semiconductor Device And Manufacturing Method Of The Same App 20160307877 - Fukasawa; Masanaga	2016-10-20
Semiconductor device and manufacturing method of the same Grant 9,425,142 - Fukasawa August 23, 2	2016-08-23
Semiconductor Device And Solid-state Imaging Device App 20160233264 - KAGAWA; Yoshihisa ; et al.	2016-08-11
Semiconductor device and manufacturing method of the same Grant 9,293,411 - Fukasawa March 22, 2	2016-03-22
Predicting ultraviolet ray damage with visible wavelength spectroscopy during a semiconductor manufacturing process Grant 9,287,097 - Kuboi , et al. March 15, 2	2016-03-15
Semiconductor Device And Manufacturing Method Of The Same App 20150357313 - Fukasawa; Masanaga	2015-12-10
Semiconductor Device And Manufacturing Method Of The Same App 20150008591 - Fukasawa; Masanaga	2015-01-08
Semiconductor device and manufacturing method of the same Grant 8,871,633 - Fukasawa October 28, 2	2014-10-28
Integrated circuit chip stack employing carbon nanotube interconnects Grant 8,586,468 - Nogami , et al. November 19, 2	2013-11-19
Simulation Method, Simulation Program, And Semiconductor Manufacturing Apparatus App 20130133832 - Kuboi; Nobuyuki ; et al.	2013-05-30
Semiconductor Device And Manufacturing Method Of The Same App 20130082401 - Fukasawa; Masanaga	2013-04-04
Method Of Manufacturing Semiconductor Device App 20090047793 - Fukasawa; Masanaga	2009-02-19
Damascene interconnection having porous low k layer with a hard mask reduced in thickness Grant 7,300,868 - Fukasawa , et al. November 27, 2	2007-11-27
Damascene interconnection having porous low k layer with a hard mask reduced in thickness App 20070231993 - Fukasawa; Masanaga ; et al.	2007-10-04
Damage recovery method for low K layer in a damascene interconnection App 20070232047 - Fukasawa; Masanaga ; et al.	2007-10-04
Single or dual damascene structure reducing or eliminating the formation of micro-trenches arising from lithographic misalignment App 20070222076 - Fukasawa; Masanaga ; et al.	2007-09-27
Integrated circuit chip stack employing carbon nanotube interconnects App 20070045762 - Nogami; Takeshi ; et al.	2007-03-01
Method of etching insulating film and method of forming interconnection layer Grant 6,943,104 - Fukasawa , et al. September 13, 2	2005-09-13
Method of etching insulating film and method of forming interconnection layer App 20040043597 - Fukasawa, Masanaga ; et al.	2004-03-04
Method of etching insulating film and method of forming interconnection layer Grant 6,638,848 - Fukasawa , et al. October 28, 2	2003-10-28
Low dielectric constant insulating films with laminated carbon-containing silicon oxide and organic layers Grant 6,407,011 - Ikeda , et al. June 18, 2	2002-06-18

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