Fukada; Takashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fukada; Takashi.The latest application filed is for "gan substrate, method for producing gan substrate, method for producing gan crystal, and method for manufacturing semiconductor device".

Company Profile

0.4.5

Fukada; Takashi - Ushiku JP
FUKADA; Takashi - Ushiku-shi JP
Fukada; Takashi - Kumamoto JP
Fukada, Takashi - Sakado-shi JP
Fukada; Takashi - Nishinomiya JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device Grant 10,655,244 - Tsukada , et al.	2020-05-19
GaN SUBSTRATE, METHOD FOR PRODUCING GaN SUBSTRATE, METHOD FOR PRODUCING GaN CRYSTAL, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE App 20180334758 - TSUKADA; Yusuke ; et al.	2018-11-22
GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device Grant 10,066,319 - Tsukada , et al. September 4, 2	2018-09-04
GaN SUBSTRATE, METHOD FOR PRODUCING GaN SUBSTRATE, METHOD FOR PRODUCING GaN CRYSTAL, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE App 20160319460 - TSUKADA; Yusuke ; et al.	2016-11-03
Etching Method And Method For Manufacturing Optical/electronic Device Using The Same App 20100304570 - Horie; Hideyoshi ; et al.	2010-12-02
Batch furnace Grant 6,879,778 - Yoo , et al. April 12, 2	2005-04-12
Batch furnace App 20040022528 - Yoo, Woo Sik ; et al.	2004-02-05
Cable modem and protocol conversion processing method App 20030126615 - Fukada, Takashi	2003-07-03
Method for forming a thin film of a silicon oxide on a silicon substrate, by BCR plasma Grant 5,753,564 - Fukada May 19, 1	1998-05-19

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