Fujiyama; Yasutomo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fujiyama; Yasutomo.The latest application filed is for "cleaning methods of porous surface and semiconductor surface".

Company Profile

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Fujiyama; Yasutomo - Atsugi JP
Fujiyama; Yasutomo - Tokyo JP
Fujiyama; Yasutomo - Kawasaki JP
Fujiyama; Yasutomo - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cleaning methods of porous surface and semiconductor surface Grant 6,058,945 - Fujiyama , et al. May 9, 2	2000-05-09
Head-mounted stereoscopic image display apparatus Grant 5,754,344 - Fujiyama May 19, 1	1998-05-19
Anodization apparatus with supporting device for substrate to be treated Grant 5,458,755 - Fujiyama , et al. October 17, 1	1995-10-17
Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process Grant 5,038,712 - Fujiyama August 13, 1	1991-08-13
Apparatus for plasma CVD Grant 4,909,183 - Kamiya , et al. March 20, 1	1990-03-20
Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process Grant 4,909,184 - Fujiyama March 20, 1	1990-03-20
Film forming apparatus Grant 4,719,873 - Fujiyama January 19, 1	1988-01-19
Apparatus and process for mass production of film by vacuum deposition Grant 4,666,734 - Kamiya , et al. May 19, 1	1987-05-19
Plasma vapor deposition film forming apparatus Grant 4,545,328 - Fujiyama , et al. October 8, 1	1985-10-08
Plasma vapor deposition film forming apparatus Grant 4,539,934 - Fujiyama , et al. September 10, 1	1985-09-10
Method of cleaning apparatus for forming deposited film Grant 4,529,474 - Fujiyama , et al. July 16, 1	1985-07-16
Treatment device utilizing plasma Grant 4,526,644 - Fujiyama , et al. July 2, 1	1985-07-02

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