Fujiwara; Seishi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fujiwara; Seishi.The latest application filed is for "caf2 polycrystalline body, focus ring, plasma processing apparatus, and method for producing caf2 polycrystalline body".

Company Profile

0.10.12

Fujiwara; Seishi - Sagamihara JP
Fujiwara, Seishi - Sagamihara-shi JP
Fujiwara, Seishi - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
CaF.sub.2 polycrystalline body, focus ring, plasma processing apparatus, and method for producing CaF.sub.2 polycrystalline body Grant 9,580,331 - Fujiwara , et al. February 28, 2	2017-02-28
CaF2 POLYCRYSTALLINE BODY, FOCUS RING, PLASMA PROCESSING APPARATUS, AND METHOD FOR PRODUCING CaF2 POLYCRYSTALLINE BODY App 20140079902 - Fujiwara; Seishi ; et al.	2014-03-20
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member App 20050284177 - Komine, Norio ; et al.	2005-12-29
Synthetic quartz glass member and method for producing the same App 20050047986 - Mizuguchi, Masafumi ; et al.	2005-03-03
Quartz glass member and projection aligner Grant 6,835,683 - Komine , et al. December 28, 2	2004-12-28
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member App 20040095566 - Komine, Norio ; et al.	2004-05-20
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member Grant 6,649,268 - Komine , et al. November 18, 2	2003-11-18
Quartz glass member and projection aligner App 20030171203 - Komine, Norio ; et al.	2003-09-11
Fluorine-containing silica glass and its method of manufacture App 20030037568 - Fujiwara, Seishi ; et al.	2003-02-27
Synthetic silica glass optical member and method of manufacturing the same App 20020144517 - Fujiwara, Seishi ; et al.	2002-10-10
Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus App 20020135746 - Jinbo, Hiroki ; et al.	2002-09-26
Synthetic silica glass molding method, synthetic silica glass molding apparatus, and synthetic silica glass App 20020050152 - Fujiwara, Seishi ; et al.	2002-05-02
Silica glass and its manufacturing method App 20020013208 - Komine, Norio ; et al.	2002-01-31
Manufacturing method of synthetic silica glass App 20020007649 - Fujiwara, Seishi ; et al.	2002-01-24
Silica glass and its manufacturing method Grant 6,291,377 - Komine , et al. September 18, 2	2001-09-18
Silica glass having superior durability against excimer laser beams and method for manufacturing the same App 20010000508 - Jinbo, Hiroki ; et al.	2001-04-26
Manufacturing method of synthetic silica glass Grant 6,094,940 - Fujiwara , et al. August 1, 2	2000-08-01
Image-focusing optical system for ultraviolet laser Grant 6,061,174 - Shiozawa , et al. May 9, 2	2000-05-09
Fluorine-containing silica glass Grant 5,958,809 - Fujiwara , et al. September 28, 1	1999-09-28
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production Grant 5,702,495 - Hiraiwa , et al. December 30, 1	1997-12-30
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production Grant 5,696,624 - Komine , et al. December 9, 1	1997-12-09
Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range Grant 5,679,125 - Hiraiwa , et al. October 21, 1	1997-10-21

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