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Template Manufacturing Method And Manufacturing Method Of Semiconductor Device
App 20160064214 - FUJISAWA; Tadahito | 2016-03-03 |
Exposure control apparatus, manufacturing method of semiconductor device, and exposure apparatus
Grant 8,373,845 - Fujisawa February 12, 2 | 2013-02-12 |
Exposure Control Apparatus, Manufacturing Method Of Semiconductor Device, And Exposure Apparatus
App 20110043776 - Fujisawa; Tadahito | 2011-02-24 |
Pattern Determining Method
App 20110047518 - Aiba; Issui ; et al. | 2011-02-24 |
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
Grant 7,855,047 - Asano , et al. December 21, 2 | 2010-12-21 |
Photo mask, exposure method using the same, and method of generating data
Grant 7,794,899 - Hashimoto , et al. September 14, 2 | 2010-09-14 |
Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device
App 20100193960 - Mashita; Hiromitsu ; et al. | 2010-08-05 |
Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device
Grant 7,716,617 - Mashita , et al. May 11, 2 | 2010-05-11 |
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
App 20100112485 - Asano; Masafumi ; et al. | 2010-05-06 |
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
App 20100112812 - Arisawa; Yukiyasu ; et al. | 2010-05-06 |
Semiconductor memory device
Grant 7,700,997 - Futatsuyama , et al. April 20, 2 | 2010-04-20 |
Pattern layout for forming integrated circuit
Grant 7,682,757 - Mashita , et al. March 23, 2 | 2010-03-23 |
Pattern creation method, mask manufacturing method and semiconductor device manufacturing method
Grant 7,669,172 - Ito , et al. February 23, 2 | 2010-02-23 |
Photo mask, exposure method using the same, and method of generating data
Grant 7,662,523 - Hashimoto , et al. February 16, 2 | 2010-02-16 |
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
Grant 7,655,369 - Asano , et al. February 2, 2 | 2010-02-02 |
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
Grant 7,636,910 - Arisawa , et al. December 22, 2 | 2009-12-22 |
Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method
Grant 7,585,597 - Fujisawa , et al. September 8, 2 | 2009-09-08 |
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
Grant 7,510,341 - Hayasaki , et al. March 31, 2 | 2009-03-31 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semi
Grant 7,474,386 - Fujisawa , et al. January 6, 2 | 2009-01-06 |
Semiconductor Memory Device And Method Of Fabricating The Same
App 20080303115 - MIYAZAKI; Shoichi ; et al. | 2008-12-11 |
Pattern Creation Method, Mask Manufacturing Method And Semiconductor Device Manufacturing Method
App 20080235650 - Ito; Takeshi ; et al. | 2008-09-25 |
Mask pattern data forming method, photomask and method of manufacturing semiconductor device
Grant 7,426,711 - Fujisawa , et al. September 16, 2 | 2008-09-16 |
Photo Mask, Exposure Method Using The Same, And Method Of Generating Data
App 20080220377 - Hashimoto; Koji ; et al. | 2008-09-11 |
Exposure control method and method of manufacturing a semiconductor device
Grant 7,396,621 - Fujisawa , et al. July 8, 2 | 2008-07-08 |
Photo mask, exposure method using the same, and method of generating data
Grant 7,384,712 - Hashimoto , et al. June 10, 2 | 2008-06-10 |
Method And Apparatus For Making Coating Film
App 20080131599 - Sato; Yasuhiko ; et al. | 2008-06-05 |
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device
Grant 7,368,209 - Shiobara , et al. May 6, 2 | 2008-05-06 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semi
Grant 7,365,830 - Fujisawa , et al. April 29, 2 | 2008-04-29 |
Photomask Designing Apparatus, Photomask, Photomask Designing Method, Photomask Designing Program And Computer-readable Storage Medium On Which The Photomask Designing Program Is Stored
App 20080014510 - FUJISAWA; Tadahito ; et al. | 2008-01-17 |
Photomask, exposure control method and method of manufacturing a semiconductor device
App 20070259280 - Fujisawa; Tadahito ; et al. | 2007-11-08 |
Mask pattern data forming method, photomask and method of manufacturing semiconductor device
App 20070195295 - Fujisawa; Tadahito ; et al. | 2007-08-23 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semi
App 20070177126 - Fujisawa; Tadahito ; et al. | 2007-08-02 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semi
App 20070177127 - Fujisawa; Tadahito ; et al. | 2007-08-02 |
Focus monitor method and mask
Grant 7,250,235 - Izuha , et al. July 31, 2 | 2007-07-31 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semi
Grant 7,230,680 - Fujisawa , et al. June 12, 2 | 2007-06-12 |
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
App 20070105028 - Asano; Masafumi ; et al. | 2007-05-10 |
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
Grant 7,175,943 - Asano , et al. February 13, 2 | 2007-02-13 |
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
App 20070005280 - Arisawa; Yukiyasu ; et al. | 2007-01-04 |
Pattern layout for forming integrated circuit
App 20060228636 - Mashita; Hiromitsu ; et al. | 2006-10-12 |
Photomask having a focus monitor pattern
Grant 7,108,945 - Sutani , et al. September 19, 2 | 2006-09-19 |
Semiconductor memory device
App 20060197136 - Futatsuyama; Takuya ; et al. | 2006-09-07 |
Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device
App 20060157833 - Mashita; Hiromitsu ; et al. | 2006-07-20 |
Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method
App 20060093926 - Fujisawa; Tadahito ; et al. | 2006-05-04 |
Dose monitoring method and manufacturing method of semiconductor device
Grant 6,919,153 - Fujisawa , et al. July 19, 2 | 2005-07-19 |
Method for forming pattern and method for manufacturing semiconductor device
App 20050123858 - Ito, Takeshi ; et al. | 2005-06-09 |
Photomask, exposure control method and method of manufacturing a semiconductor device
App 20050030502 - Fujisawa, Tadahito ; et al. | 2005-02-10 |
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
App 20050008979 - Hayasaki, Kei ; et al. | 2005-01-13 |
Photo mask, exposure method using the same, and method of generating data
App 20050003305 - Hashimoto, Koji ; et al. | 2005-01-06 |
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method semiconductor device
App 20040265713 - Shiobara, Eishi ; et al. | 2004-12-30 |
Focus monitor method and mask
App 20040224242 - Izuha, Kyoko ; et al. | 2004-11-11 |
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
App 20040219439 - Asano, Masafumi ; et al. | 2004-11-04 |
Exposure method and apparatus
Grant 6,813,001 - Fujisawa , et al. November 2, 2 | 2004-11-02 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semi
App 20040185662 - Fujisawa, Tadahito ; et al. | 2004-09-23 |
Exposure method, exposure system and recording medium
Grant 6,741,334 - Asano , et al. May 25, 2 | 2004-05-25 |
Dose monitoring method and manufacturing method of semiconductor device
App 20040058256 - Fujisawa, Tadahito ; et al. | 2004-03-25 |
Focus monitoring method, exposure apparatus, and exposure mask
Grant 6,701,512 - Sutani , et al. March 2, 2 | 2004-03-02 |
Method of manufacturing semiconductor device
Grant 6,667,139 - Fujisawa , et al. December 23, 2 | 2003-12-23 |
Photomask having a focus monitor pattern
App 20030219655 - Sutani, Takumichi ; et al. | 2003-11-27 |
Exposure method and apparatus
App 20030090640 - Fujisawa, Tadahito ; et al. | 2003-05-15 |
Method of manufacturing semiconductor device
App 20020182521 - Fujisawa, Tadahito ; et al. | 2002-12-05 |
Focus monitoring method, exposure apparatus, and exposure mask
App 20020100012 - Sutani, Takumichi ; et al. | 2002-07-25 |
Exposure method, exposure system and recording medium
App 20020087943 - Asano, Masafumi ; et al. | 2002-07-04 |
Control method for exposure apparatus and control method for semiconductor manufacturing apparatus
Grant 6,376,139 - Fujisawa , et al. April 23, 2 | 2002-04-23 |
Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices
Grant 6,226,074 - Fujisawa , et al. May 1, 2 | 2001-05-01 |
Photomask, exposing method using photomask, and manufacturing method of photomask
Grant 5,733,687 - Tanaka , et al. March 31, 1 | 1998-03-31 |
Filter manufacturing apparatus
Grant 5,707,501 - Inoue , et al. January 13, 1 | 1998-01-13 |
Exposure apparatus and method
Grant 5,673,103 - Inoue , et al. September 30, 1 | 1997-09-30 |
Projectin exposure apparatus
Grant 5,627,626 - Inoue , et al. May 6, 1 | 1997-05-06 |
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