Fujikawa; Junichi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Fujikawa; Junichi.The latest application filed is for "water developable photosensitive resin composition".
- Fujikawa; Junichi - Kyoto JP
- Fujikawa; Junichi - Otsu JA
| Patent | Date |
|---|---|
| Water developable photosensitive resin composition Grant 4,606,993 - Fujikawa , et al. August 19, 1 | 1986-08-19 |
| Process of making a polyamide printing plate having an improved contact with an image-bearing film Grant 4,576,897 - Fujikawa , et al. March 18, 1 | 1986-03-18 |
| Photosensitive polymer compositions comprising polyether-ester amides Grant 4,464,456 - Fujikawa , et al. August 7, 1 | 1984-08-07 |
| Radiation curable coating composition and precoated metal having top coat based on the same Grant 4,012,559 - Fujioka , et al. March 15, 1 | 1977-03-15 |
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