| Patent | Date |
|---|
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
Grant 10,248,019 - Kataoka , et al. | 2019-04-02 |
Pattern forming method and resist composition
Grant 10,126,653 - Iwato , et al. November 13, 2 | 2018-11-13 |
Method of forming pattern and developer for use in the method
Grant 9,897,922 - Enomoto , et al. February 20, 2 | 2018-02-20 |
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same
Grant 9,709,892 - Kataoka , et al. July 18, 2 | 2017-07-18 |
Pattern forming method and resist composition
Grant 9,551,935 - Kato , et al. January 24, 2 | 2017-01-24 |
Method Of Forming Pattern And Developer For Use In The Method
App 20160349620 - ENOMOTO; Yuichiro ; et al. | 2016-12-01 |
Method of forming pattern and developer for use in the method
Grant 9,482,958 - Enomoto , et al. November 1, 2 | 2016-11-01 |
Method Of Forming Pattern And Developer For Use In The Method
App 20150293454 - ENOMOTO; Yuichiro ; et al. | 2015-10-15 |
Resist composition, resist film therefrom and method of forming negative pattern using the composition
Grant 9,122,151 - Fujii , et al. September 1, 2 | 2015-09-01 |
Method of forming pattern and developer for use in the method
Grant 9,097,973 - Enomoto , et al. August 4, 2 | 2015-08-04 |
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
Grant 8,877,423 - Fujii , et al. November 4, 2 | 2014-11-04 |
Method of forming pattern and developer for use in the method
Grant 8,871,642 - Enomoto , et al. October 28, 2 | 2014-10-28 |
Negative pattern forming method and resist pattern
Grant 8,859,192 - Kato , et al. October 14, 2 | 2014-10-14 |
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
Grant 8,795,945 - Fujii , et al. August 5, 2 | 2014-08-05 |
Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same
Grant 8,741,542 - Tsuchimura , et al. June 3, 2 | 2014-06-03 |
Pattern forming method, chemical amplification resist composition and resist film
Grant 8,647,812 - Fujii , et al. February 11, 2 | 2014-02-11 |
Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
Grant 8,642,245 - Fujii , et al. February 4, 2 | 2014-02-04 |
Negative Pattern Forming Method And Resist Pattern
App 20130266777 - KATO; Keita ; et al. | 2013-10-10 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method
Grant 8,541,161 - Fujii , et al. September 24, 2 | 2013-09-24 |
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Resist Film
App 20130122427 - KATAOKA; Shohei ; et al. | 2013-05-16 |
Method Of Forming Pattern And Developer For Use In The Method
App 20130113082 - Enomoto; Yuichiro ; et al. | 2013-05-09 |
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Same
App 20130017377 - Kataoka; Shohei ; et al. | 2013-01-17 |
Pattern Forming Method And Resist Composition
App 20130011785 - Kato; Keita ; et al. | 2013-01-10 |
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film
App 20130011619 - Fujii; Kana ; et al. | 2013-01-10 |
Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith
Grant 8,349,535 - Fujii , et al. January 8, 2 | 2013-01-08 |
Pattern Forming Method And Resist Composition
App 20120321855 - Iwato; Kaoru ; et al. | 2012-12-20 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, And Resist Film And Pattern Forming Method Using The Same
App 20120301831 - Fujii; Kana ; et al. | 2012-11-29 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Film Formed Using The Composition And Pattern Forming Method Using The Same
App 20120244472 - Tsuchimura; Tomotaka ; et al. | 2012-09-27 |
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming A Pattern Using The Same
App 20120231393 - FUJII; Kana ; et al. | 2012-09-13 |
Resist Composition, Resist Film Therefrom And Method Of Forming Negative Pattern Using The Composition
App 20120219758 - ODANI; Tadahiro ; et al. | 2012-08-30 |
Resist Composition, Resist Film Therefrom And Method Of Forming Negative Pattern Using The Composition
App 20120219891 - FUJII; Kana ; et al. | 2012-08-30 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method Using The Same
App 20120094237 - Fujii; Kana ; et al. | 2012-04-19 |
Method Of Forming Pattern And Developer For Use In The Method
App 20120003591 - ENOMOTO; Yuichiro ; et al. | 2012-01-05 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film Using The Same And Pattern Forming Method
App 20120003586 - Fujii; Kana ; et al. | 2012-01-05 |
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Therewith
App 20110081612 - FUJII; Kana ; et al. | 2011-04-07 |
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