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name:-0.012031078338623
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Fu; Shih-Kang Patent Filings

Fu; Shih-Kang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fu; Shih-Kang.The latest application filed is for "chemical mechanical polishing topography reset and control on interconnect metal lines".

Company Profile
4.10.11
  • Fu; Shih-Kang - Taoyuan County TW
  • FU; Shih-Kang - Hsinchu TW
  • Fu; Shih-Kang - Zhongli TW
  • Fu; Shih-Kang - Taoyuan TW
  • FU; Shih-Kang - Zhongli City TW
  • FU; Shih-Kang - Taoyuan City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Hybrid method for forming semiconductor interconnect structure
Grant 11,450,602 - Fu , et al. September 20, 2
2022-09-20
Chemical Mechanical Polishing Topography Reset And Control On Interconnect Metal Lines
App 20220270915 - FU; Shih-Kang ;   et al.
2022-08-25
Chemical mechanical polishing topography reset and control on interconnect metal lines
Grant 11,342,219 - Fu , et al. May 24, 2
2022-05-24
Chemical Mechanical Polishing Topography Reset And Control On Interconnect Metal Lines
App 20220102191 - FU; Shih-Kang ;   et al.
2022-03-31
Methods of Performing Chemical-Mechanical Polishing Process in Semiconductor Devices
App 20220068701 - Fu; Shih-Kang ;   et al.
2022-03-03
Method with CMP for metal ion prevention
Grant 11,211,256 - Fu , et al. December 28, 2
2021-12-28
Methods of performing chemical-mechanical polishing process in semiconductor devices
Grant 11,152,255 - Fu , et al. October 19, 2
2021-10-19
Hybrid Method for Forming Semiconductor Interconnect Structure
App 20210313262 - Fu; Shih-Kang ;   et al.
2021-10-07
Semiconductor device and manufacturing method thereof
Grant 11,127,680 - Fu , et al. September 21, 2
2021-09-21
Method with CMP for Metal Ion Prevention
App 20210265172 - Fu; Shih-Kang ;   et al.
2021-08-26
Semiconductor device and forming method thereof
Grant 10,879,115 - Lee , et al. December 29, 2
2020-12-29
Methods of Performing Chemical-Mechanical Polishing Process in Semiconductor Devices
App 20200312708 - Fu; Shih-Kang ;   et al.
2020-10-01
Semiconductor Device And Forming Method Thereof
App 20190157144 - LEE; Ming-Han ;   et al.
2019-05-23
Method for forming conductive structure using polishing process
Grant 10,163,700 - Fu , et al. Dec
2018-12-25
Semiconductor Device And Manufacturing Method Thereof
App 20170287842 - FU; Shih-Kang ;   et al.
2017-10-05
Semiconductor device and manufacturing method thereof
Grant 9,721,894 - Fu , et al. August 1, 2
2017-08-01
Conductive Structure And Method For Forming Conductive Structure Using Polishing Process
App 20170194201 - FU; Shih-Kang ;   et al.
2017-07-06
Semiconductor Device And Manufacturing Method Thereof
App 20170092591 - FU; Shih-Kang ;   et al.
2017-03-30
Semiconductor device and manufacturing method thereof
Grant 9,530,737 - Fu , et al. December 27, 2
2016-12-27
System and method for chemical-mechanical planarization of a metal layer
Grant 9,330,989 - Wu , et al. May 3, 2
2016-05-03
System And Method For Chemical-mechanical Planarization Of A Metal Layer
App 20140091477 - Wu; Yung-Hsu ;   et al.
2014-04-03

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