Frost; Rex K.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Frost; Rex K..The latest application filed is for "photoresist formulation with surfactant additive".

Company Profile

0.4.5

Frost; Rex K. - Hillsboro OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Accommodating diffraction in the printing of features on a substrate Grant 7,288,344 - Frost , et al. October 30, 2	2007-10-30
Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow Grant 7,258,965 - Frost , et al. August 21, 2	2007-08-21
Photoresist formulation with surfactant additive App 20060046183 - Yueh; Wang ; et al.	2006-03-02
Solvent vapor-assisted plasticization of photoresist films to achieve critical dimension reduction during temperature reflow Grant 6,977,219 - Frost , et al. December 20, 2	2005-12-20
Multiple exposure technique to pattern tight contact geometries Grant 6,968,532 - Sivakumar , et al. November 22, 2	2005-11-22
Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow App 20050147928 - Frost, Rex K. ; et al.	2005-07-07
Solvent vapor-assisted plasticization of photoresist films to achieve critical dimension reduction during temperature reflow App 20050148169 - Frost, Rex K. ; et al.	2005-07-07
Accommodating diffraction in the printing of features on a substrate App 20050097502 - Frost, Rex K. ; et al.	2005-05-05
Multiple exposure technique to pattern tight contact geometries App 20050081178 - Sivakumar, Swaminathan (Sam) ; et al.	2005-04-14

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