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Patent applications and USPTO patent grants for Friddle; Phil.The latest application filed is for "method for selectively etching with reduced aspect ratio dependence".
Patent | Date |
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Method for selectively etching with reduced aspect ratio dependence Grant 10,541,141 - Basavalingappa , et al. Ja | 2020-01-21 |
Method For Selectively Etching With Reduced Aspect Ratio Dependence App 20180330959 - BASAVALINGAPPA; Adarsh ;   et al. | 2018-11-15 |
Systems For Performing In-situ Deposition Of Sidewall Image Transfer Spacers App 20180247828 - LEE; Jae Ho ;   et al. | 2018-08-30 |
Method for selectively etching with reduced aspect ratio dependence Grant 10,037,890 - Basavalingappa , et al. July 31, 2 | 2018-07-31 |
Systems and methods for performing in-situ deposition of sidewall image transfer spacers Grant 9,972,502 - Lee , et al. May 15, 2 | 2018-05-15 |
Method For Selectively Etching With Reduced Aspect Ratio Dependence App 20180102253 - BASAVALINGAPPA; Adarsh ;   et al. | 2018-04-12 |
Systems And Methods For Performing In-situ Deposition Of Sidewall Image Transfer Spacers App 20170076957 - Lee; Jae Ho ;   et al. | 2017-03-16 |
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