name:-0.0050890445709229
name:-0.0077309608459473
name:-0.0032901763916016
Freeman; Melissa Patent Filings

Freeman; Melissa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Freeman; Melissa.The latest application filed is for "system and method for removing energy from an electrical choke".

Company Profile
3.8.4
  • Freeman; Melissa - Oconomowoc WI
  • Freeman; Melissa - Madison WI
  • Freeman; Melissa - Salem VA
  • Freeman; Melissa - Round Rock TX
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks
Patent Activity
PatentDate
System and method for removing energy from an electrical choke
Grant 10,746,816 - Link , et al. A
2020-08-18
Switching amplifier and method for estimating remaining lifetime of a switching amplifier
Grant 10,481,207 - Sabate , et al. Nov
2019-11-19
System And Method For Removing Energy From An Electrical Choke
App 20190242951 - LINK; DOUGLAS JOHN ;   et al.
2019-08-08
Cascaded electrical device bus structure systems and methods
Grant 10,185,141 - Wang , et al. Ja
2019-01-22
Cascaded Electrical Device Bus Structure Systems And Methods
App 20180373020 - Wang; Ruxi ;   et al.
2018-12-27
Switching Amplifier And Method For Estimating Remaining Lifetime Of A Switching Amplifier
App 20170276730 - Sabate; Juan Antonio ;   et al.
2017-09-28
Liquid-cooled Grounded Heatsink For Diode Rectifier System
App 20090052134 - Casteel; Jordan B. ;   et al.
2009-02-26
Chemical mechanical polishing (CMP) slurry for polishing copper interconnects which use tantalum-based barrier layers
Grant 6,001,730 - Farkas , et al. December 14, 1
1999-12-14
Process for forming a semiconductor device
Grant 5,935,871 - Farkas , et al. August 10, 1
1999-08-10
Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture
Grant 5,897,375 - Watts , et al. April 27, 1
1999-04-27
Method for chemically-mechanically polishing a metal layer
Grant 5,863,838 - Farkas , et al. January 26, 1
1999-01-26
Method for using ammonium salt slurries for chemical mechanical polishing (CMP)
Grant 5,773,364 - Farkas , et al. June 30, 1
1998-06-30
Company Registrations

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