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Patent applications and USPTO patent grants for Fredericks; Edward C..The latest application filed is for "sub-layer contact technique using in situ doped amorphous silicon and solid phase recrystallization".
Patent | Date |
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Sub-layer contact technique using in situ doped amorphous silicon and solid phase recrystallization Grant 5,192,708 - Beyer , et al. March 9, 1 | 1993-03-09 |
Lithography imaging tool and related photolithographic processes Grant 5,087,537 - Conway , et al. February 11, 1 | 1992-02-11 |
Method for improving resolution in microelectronic circuits using photoresist overlayer by using thermally processed polyimide underlayer formed from positive photoresist and polyamic acid Grant 4,745,045 - Fredericks , et al. May 17, 1 | 1988-05-17 |
Semiconductor contact protection Grant 4,640,738 - Fredericks , et al. February 3, 1 | 1987-02-03 |
Multi-level resist image reversal lithography process Grant 4,567,132 - Fredericks , et al. January 28, 1 | 1986-01-28 |
Process for forming resist masks utilizing O-quinone diazide and pyrene Grant 4,464,458 - Chow , et al. August 7, 1 | 1984-08-07 |
Resist image hardening process Grant 4,125,650 - Chiu , et al. November 14, 1 | 1978-11-14 |
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