Fovell; Richard

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fovell; Richard.The latest application filed is for "modular microwave source with multiple metal housings".

Company Profile

7.37.44

Fovell; Richard - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Modular Microwave Source With Multiple Metal Housings App 20210391149 - Kraus; Philip Allan ; et al.	2021-12-16
Methods And Apparatus For Processing A Substrate App 20210351021 - SILVEIRA; Fernando ; et al.	2021-11-11
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates Grant 10,811,226 - Carducci , et al. October 20, 2	2020-10-20
Apparatus for controlling temperature uniformity of a showerhead Grant 10,780,447 - Fovell , et al. Sept	2020-09-22
Distributed electro-static chuck cooling Grant 10,537,013 - Silveira , et al. Ja	2020-01-14
Method of real time in-situ chamber condition monitoring using sensors and RF communication Grant 10,395,904 - Wong , et al. A	2019-08-27
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding Grant 10,249,470 - Kenney , et al.	2019-04-02
Method of Real Time In-Situ Chamber Condition Monitoring Using Sensors and Rf Communication App 20190096641 - Wong; Lawrence ; et al.	2019-03-28
Plasma Reactor Having Radial Struts for Substrate Support App 20190085467 - Nguyen; Andrew ; et al.	2019-03-21
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding Grant 10,170,279 - Kenney , et al. J	2019-01-01
Method of real time in-situ chamber condition monitoring using sensors and RF communication Grant 10,141,166 - Wong , et al. Nov	2018-11-27
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow Grant 10,131,994 - Nguyen , et al. November 20, 2	2018-11-20
Inductively Coupled Plasma Source With Symmetrical Rf Feed And Reactance Elements App 20180218873 - Kenney; Jason A. ; et al.	2018-08-02
Plasma Source With Symmetrical Rf Feed App 20180211811 - Kenney; Jason A. ; et al.	2018-07-26
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Distribution Plates App 20180138014 - Carducci; James D. ; et al.	2018-05-17
Inductively coupled plasma source with symmetrical RF feed Grant 9,928,987 - Kenney , et al. March 27, 2	2018-03-27
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure Grant 9,896,769 - Nguyen , et al. February 20, 2	2018-02-20
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates Grant 9,870,897 - Carducci , et al. January 16, 2	2018-01-16
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow Chamber App 20170350017 - Nguyen; Andrew ; et al.	2017-12-07
Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure App 20170350018 - Nguyen; Andrew ; et al.	2017-12-07
Apparatus For Controlling Temperature Uniformity Of A Showerhead App 20170304849 - Fovell; Richard ; et al.	2017-10-26
Symmetrical inductively coupled plasma source with symmetrical flow chamber Grant 9,745,663 - Nguyen , et al. August 29, 2	2017-08-29
Method Of Real Time In-situ Chamber Condition Monitoring Using Sensors And Rf Communication App 20160048111 - Wong; Lawrence ; et al.	2016-02-18
Electron Beam Plasma Source With Rotating Cathode, Backside Heliumcooling And Liquid Cooled Pedestal For Uniform Plasma Generation App 20160042961 - Dorf; Leonid ; et al.	2016-02-11
Methods and apparatus for rapidly responsive heat control in plasma processing devices Grant 9,155,134 - Zhang , et al. October 6, 2	2015-10-06
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates Grant 9,082,590 - Carducci , et al. July 14, 2	2015-07-14
Plasma reactor with a multiple zone thermal control feed forward control apparatus Grant 8,980,044 - Brillhart , et al. March 17, 2	2015-03-17
Methods and apparatus for rapidly responsive heat control in plasma processing devices Grant 8,895,889 - Zhang , et al. November 25, 2	2014-11-25
Symmetrical Plural-coil Plasma Source With Side Rf Feeds And Rf Distribution Plates App 20140312766 - Carducci; James D. ; et al.	2014-10-23
Multiple Coil Inductively Coupled Plasma Source With Offset Frequencies And Double-walled Shielding App 20140265832 - Kenney; Jason A. ; et al.	2014-09-18
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor Grant 8,801,893 - Brillhart , et al. August 12, 2	2014-08-12
Symmetrical Inductively Coupled Plasma Source With Side Rf Feeds And Rf Distribution Plates App 20140021861 - Carducci; James D. ; et al.	2014-01-23
Symmetrical Inductively Coupled Plasma Source With Coaxial Rf Feed And Coaxial Shielding App 20140020838 - Kenney; Jason A. ; et al.	2014-01-23
Symmetrical Inductively Coupled Plasma Source With Symmetrical Flow Chamber App 20140020835 - Nguyen; Andrew ; et al.	2014-01-23
Inductively Coupled Plasma Source With Symmetrical Rf Feed App 20140020839 - Kenney; Jason A. ; et al.	2014-01-23
Inductively Coupled Plasma Source With Multiple Dielectric Windows And Window-supporting Structure App 20140020837 - NGUYEN; ANDREW ; et al.	2014-01-23
Inductively Coupled Plasma Source With Plural Top Coils Over A Ceiling And An Independent Side Coil App 20140020836 - NGUYEN; ANDREW ; et al.	2014-01-23
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Grant 8,608,900 - Buchberger, Jr. , et al. December 17, 2	2013-12-17
Substrate support temperature control Grant 8,596,336 - Fovell , et al. December 3, 2	2013-12-03
Distributed Electro-static Chuck Cooling App 20130276981 - Silveira; Fernando ; et al.	2013-10-24
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control Grant 8,546,267 - Brillhart , et al. October 1, 2	2013-10-01
Fast Response Fluid Temperature Control System App 20130240144 - Buchberger; Douglas A. ; et al.	2013-09-19
Methods And Apparatus For Rapidly Responsive Heat Control In Plasma Processing Devices App 20130180963 - ZHANG; CHUNLEI ; et al.	2013-07-18
Capacitively coupled plasma reactor having very agile wafer temperature control Grant 8,337,660 - Buchberger, Jr. , et al. December 25, 2	2012-12-25
Method of processing a workpiece in a plasma reactor using feed forward thermal control Grant 8,329,586 - Buchberger, Jr. , et al. December 11, 2	2012-12-11
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops Grant 8,221,580 - Buchberger, Jr. , et al. July 17, 2	2012-07-17
Capacitively coupled plasma reactor having very agile wafer temperature control Grant 8,157,951 - Buchberger, Jr. , et al. April 17, 2	2012-04-17
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Grant 8,092,639 - Buchberger, Jr. , et al. January 10, 2	2012-01-10
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution Grant 8,092,638 - Brillhart , et al. January 10, 2	2012-01-10
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor Grant 8,034,180 - Brillhart , et al. October 11, 2	2011-10-11
Method for agile workpiece temperature control in a plasma reactor using a thermal model Grant 8,021,521 - Buchberger, Jr. , et al. September 20, 2	2011-09-20
Plasma reactor with a multiple zone thermal control feed forward control apparatus Grant 8,012,304 - Brillhart , et al. September 6, 2	2011-09-06
Method of operating a capacitively coupled plasma reactor with dual temperature control loops Grant 7,988,872 - Brillhart , et al. August 2, 2	2011-08-02
Method Of Processing A Workpiece In A Plasma Reactor Using Multiple Zone Feed Forward Thermal Control App 20110068085 - Brillhart; Paul Lukas ; et al.	2011-03-24
Method Of Processing A Workpiece In A Plasma Reactor Using Feed Forward Thermal Control App 20110065279 - Buchberger, JR.; Douglas A. ; et al.	2011-03-17
Capacitivley Coupled Plasma Reactor Having A Cooled/heated Wafer Support With Uniform Temperature Distribution App 20100319852 - Brillhart; Paul Lukas ; et al.	2010-12-23
Plasma Reactor With Feed Forward Thermal Control System Using A Thermal Model For Accommodating Rf Power Changes Or Wafer Temperature Changes App 20100319851 - Buchberger, JR.; Douglas A. ; et al.	2010-12-23
Plasma Reactor With A Multiple Zone Thermal Control Feed Forward Control Apparatus App 20100314046 - Brillhart; Paul Lukas ; et al.	2010-12-16
Method Of Cooling A Wafer Support At A Uniform Temperature In A Capacitively Coupled Plasma Reactor App 20100300621 - Brillhart; Paul Lukas ; et al.	2010-12-02
Capacitively Coupled Plasma Reactor Having Very Agile Wafer Temperature Control App 20100303680 - Buchberger, JR.; Douglas A. ; et al.	2010-12-02
Methods And Apparatus For Rapidly Responsive Heat Control In Plasma Processing Devices App 20100096109 - ZHANG; CHUNLEI ; et al.	2010-04-22
Fast Substrate Support Temperature Control App 20090294101 - FOVELL; RICHARD ; et al.	2009-12-03
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor App 20070097580 - Brillhart; Paul Lukas ; et al.	2007-05-03
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops App 20070091538 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Plasma reactor with a multiple zone thermal control feed forward control apparatus App 20070089834 - Brillhart; Paul Lukas ; et al.	2007-04-26
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes App 20070091539 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Method of processing a workpiece in a plasma reactor using feed forward thermal control App 20070091541 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Method for agile workpiece temperature control in a plasma reactor using a thermal model App 20070091537 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control App 20070091540 - Brillhart; Paul Lukas ; et al.	2007-04-26
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution App 20070081295 - Brillhart; Paul Lukas ; et al.	2007-04-12
Method of operating a capacitively coupled plasma reactor with dual temperature control loops App 20070081296 - Brillhart; Paul Lukas ; et al.	2007-04-12
Capacitively coupled plasma reactor having very agile wafer temperature control App 20070081294 - Buchberger; Douglas A. JR. ; et al.	2007-04-12
Temperature controlled window with a fluid supply system Grant 6,916,399 - Rozenzon , et al. July 12, 2	2005-07-12

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