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name:-0.013092994689941
name:-0.00655198097229
name:-0.0058729648590088
Foca; Eugen Patent Filings

Foca; Eugen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Foca; Eugen.The latest application filed is for "contact area size determination between 3d structures in an integrated semiconductor sample".

Company Profile
5.6.11
  • Foca; Eugen - Ellwangen DE
  • Foca; Eugen - Lauchheim DE
  • Foca; Eugen - Radebeul DE
  • Foca; Eugen - Radeseul DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method and devices for determining metrology sites
Grant 11,436,506 - Srikantha , et al. September 6, 2
2022-09-06
Contact Area Size Determination Between 3d Structures In An Integrated Semiconductor Sample
App 20220230899 - Buxbaum; Alex ;   et al.
2022-07-21
FIB-SEM 3D Tomography for measuring shape deviations of HAR structures
App 20220223445 - Avishai; Amir ;   et al.
2022-07-14
Cross Section Imaging With Improved 3d Volume Image Reconstruction Accuracy
App 20220138973 - Korb; Thomas ;   et al.
2022-05-05
Root Cause Analysis For Fabrication Processes Of Semiconductor Structures
App 20210097673 - Neumann; Jens Timo ;   et al.
2021-04-01
Method And Devices For Determining Metrology Sites
App 20200285976 - Srikantha; Abhilash ;   et al.
2020-09-10
Vacuum system, in particular EUV lithography system, and optical element
Grant 10,599,052 - Roos , et al.
2020-03-24
Projection exposure apparatus and method for measuring a projection lens
Grant 10,585,356 - Foca , et al.
2020-03-10
Vacuum System, In Particular Euv Lithography System, And Optical Element
App 20190196344 - ROOS; Matthias ;   et al.
2019-06-27
Vacuum system, in particular EUV lithography system, and optical element
Grant 10,241,421 - Roos , et al.
2019-03-26
Projection Exposure Apparatus And Method For Measuring A Projection Lens
App 20180373163 - FOCA; Eugen ;   et al.
2018-12-27
Vacuum linear feed-through and vacuum system having said vacuum linear feed-through
Grant 9,952,519 - Roos , et al. April 24, 2
2018-04-24
Vacuum Linear Feed-through And Vacuum System Having Said Vacuum Linear Feed-through
App 20170212428 - Roos; Matthias ;   et al.
2017-07-27
Vacuum System, in Particular EUV Lithography System, and Optical Element
App 20170168402 - Roos; Matthias ;   et al.
2017-06-15
Particle beam writing method, particle beam writing apparatus and maintenance method for same
Grant 8,257,888 - Sczyrba , et al. September 4, 2
2012-09-04
Reducing Ion Migration Of Absorber Materials Of Lithography Masks By Chromium Passivation
App 20110027699 - Tchikoulaeva; Anna ;   et al.
2011-02-03
Particle Beam Writing Method, Particle Beam Writing Apparatus and Maintenance Method for Same
App 20100104961 - Sczyrba; Martin ;   et al.
2010-04-29

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