Flaugh; Matthew
Patent Applications and Registrations
Patent applications and USPTO patent grants for Flaugh; Matthew.The latest application filed is for "gas phase etch with controllable etch selectivity of metals".
- Flaugh; Matthew - Albany NY
| Patent | Date |
|---|---|
| Atomic layer etch (ALE) of tungsten or other metal layers Grant 11,189,499 - Tsai , et al. November 30, 2 | 2021-11-30 |
| Gas Phase Etch With Controllable Etch Selectivity Of Metals App 20210020454 - Kal; Subhadeep ; et al. | 2021-01-21 |
| Atomic Layer Etch (ale) Of Tungsten Or Other Metal Layers App 20200312673 - Tsai; Yu-Hao ; et al. | 2020-10-01 |
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