loadpatents
name:-0.06168007850647
name:-0.28990793228149
name:-0.00055885314941406
Fitzgerald; Eugene Patent Filings

Fitzgerald; Eugene

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fitzgerald; Eugene.The latest application filed is for "apparatus and method for wireless communication".

Company Profile
0.7.9
  • Fitzgerald; Eugene - Cambridge MA
  • Fitzgerald; Eugene - Windham NH
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Apparatus And Method For Wireless Communication
App 20210250057 - Choi; Pilsoon ;   et al.
2021-08-12
Method of producing high quality relaxed silicon germanium layers
Grant 8,187,379 - Fitzgerald , et al. May 29, 2
2012-05-29
Semiconductor Structures Employing Strained Material Layers with Defined Impurity Gradients and Methods for Fabricating Same
App 20120086047 - Currie; Matthew ;   et al.
2012-04-12
Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same
Grant 8,106,380 - Currie , et al. January 31, 2
2012-01-31
Method of producing high quality relaxed silicon germanium layers
Grant 7,955,435 - Fitzgerald , et al. June 7, 2
2011-06-07
Semiconductor Structures Employing Strained Material Layers with Defined Impurity Gradients and Methods for Fabricating Same
App 20110095363 - Currie; Matthew ;   et al.
2011-04-28
Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same
Grant 7,884,353 - Currie , et al. February 8, 2
2011-02-08
Semiconductor Structures Employing Strained Material Layers With Defined Impurity Gradients And Methods For Fabricating Same
App 20070293003 - Currie; Matthew ;   et al.
2007-12-20
Semiconductor Structures Employing Strained Material Layers With Defined Impurity Gradients And Methods For Fabricating Same
App 20070293009 - Currie; Matthew ;   et al.
2007-12-20
Methods for fabricating strained layers on semiconductor substrates
Grant 7,259,108 - Fitzgerald , et al. August 21, 2
2007-08-21
Methods for fabricating strained layers on semiconductor substrates
App 20060148225 - Fitzgerald; Eugene ;   et al.
2006-07-06
Methods for fabricating strained layers on semiconductor substrates
Grant 7,060,632 - Fitzgerald , et al. June 13, 2
2006-06-13
Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same
App 20050054168 - Currie, Matthew ;   et al.
2005-03-10
Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same
Grant 6,831,292 - Currie , et al. December 14, 2
2004-12-14
Methods for fabricating strained layers on semiconductor substrates
App 20030215990 - Fitzgerald, Eugene ;   et al.
2003-11-20
Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same
App 20030057416 - Currie, Matthew ;   et al.
2003-03-27

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