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Patent applications and USPTO patent grants for Fiekowsky; Peter J..The latest application filed is for "fast image simulation for photolithography".
Patent | Date |
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Fast image simulation for photolithography Grant 7,472,372 - Fiekowsky , et al. December 30, 2 | 2008-12-30 |
Fast image simulation for photolithography Grant 6,765,651 - Fiekowsky , et al. July 20, 2 | 2004-07-20 |
Optical proximity correction serif measurement technique Grant 6,760,473 - Fiekowsky July 6, 2 | 2004-07-06 |
Scanning-beam X-ray imaging system Grant 6,649,914 - Moorman , et al. November 18, 2 | 2003-11-18 |
Microscopic corner radius measurement system Grant 6,397,165 - Fiekowsky May 28, 2 | 2002-05-28 |
High accuracy particle dimension measurement system Grant 6,263,292 - Fiekowsky July 17, 2 | 2001-07-17 |
High accuracy particle dimension measurement system Grant 6,167,355 - Fiekowsky December 26, 2 | 2000-12-26 |
High accuracy particle dimension measurement system Grant 5,966,677 - Fiekowsky October 12, 1 | 1999-10-12 |
Flat panel display inspection system Grant 5,764,209 - Hawthorne , et al. June 9, 1 | 1998-06-09 |
Image reconstruction methods Grant 5,751,785 - Moorman , et al. May 12, 1 | 1998-05-12 |
Scanning-beam X-ray imaging system Grant 5,729,584 - Moorman , et al. March 17, 1 | 1998-03-17 |
Image reconstruction methods Grant 5,644,612 - Moorman , et al. July 1, 1 | 1997-07-01 |
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