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Patent applications and USPTO patent grants for Fiedler; Olaf.The latest application filed is for "apparatus and method of forming a semiconductor layer".
Patent | Date |
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Apparatus and Method of Forming a Semiconductor Layer App 20220051891 - Fiedler; Olaf ;   et al. | 2022-02-17 |
Substrate Processing Chamber And Process Gas Flow Deflector For Use In The Processing Chamber App 20220018023 - Kuenle; Matthias ;   et al. | 2022-01-20 |
Semiconductor device with buffer region Grant 10,692,970 - Kowalik-Seidl , et al. | 2020-06-23 |
Apparatus and Method of Depositing a Layer at Atmospheric Pressure App 20200063257 - Fiedler; Olaf ;   et al. | 2020-02-27 |
Apparatus and Method of Forming a Semiconductor Layer App 20190252185 - Fiedler; Olaf ;   et al. | 2019-08-15 |
Semiconductor Device with Buffer Region App 20190148484 - Kowalik-Seidl; Katarzyna ;   et al. | 2019-05-16 |
Variable timing camshaft drive system Grant 5,606,941 - Trzmiel , et al. March 4, 1 | 1997-03-04 |
Chain drive tensioning and adjusting arrangement Grant 5,109,813 - Trzmiel , et al. May 5, 1 | 1992-05-05 |
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