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Fiedler; Olaf Patent Filings

Fiedler; Olaf

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fiedler; Olaf.The latest application filed is for "apparatus and method of forming a semiconductor layer".

Company Profile
4.3.5
  • Fiedler; Olaf - Dresden DE
  • Fiedler; Olaf - Remchingen DE
  • Fiedler; Olaf - Pforzheim DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Apparatus and Method of Forming a Semiconductor Layer
App 20220051891 - Fiedler; Olaf ;   et al.
2022-02-17
Substrate Processing Chamber And Process Gas Flow Deflector For Use In The Processing Chamber
App 20220018023 - Kuenle; Matthias ;   et al.
2022-01-20
Semiconductor device with buffer region
Grant 10,692,970 - Kowalik-Seidl , et al.
2020-06-23
Apparatus and Method of Depositing a Layer at Atmospheric Pressure
App 20200063257 - Fiedler; Olaf ;   et al.
2020-02-27
Apparatus and Method of Forming a Semiconductor Layer
App 20190252185 - Fiedler; Olaf ;   et al.
2019-08-15
Semiconductor Device with Buffer Region
App 20190148484 - Kowalik-Seidl; Katarzyna ;   et al.
2019-05-16
Variable timing camshaft drive system
Grant 5,606,941 - Trzmiel , et al. March 4, 1
1997-03-04
Chain drive tensioning and adjusting arrangement
Grant 5,109,813 - Trzmiel , et al. May 5, 1
1992-05-05

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