Feng; Chuguang
Patent Applications and Registrations
Patent applications and USPTO patent grants for Feng; Chuguang.The latest application filed is for "method for patterning fins and gates in a finfet device using trimmed hard-mask capped with imaging layer".
- Feng; Chuguang - Kowloon CN
| Patent | Date |
|---|---|
| Method for patterning fins and gates in a FinFET device using trimmed hard-mask capped with imaging layer App 20060177977 - Chan; Philip Ching Ho ; et al. | 2006-08-10 |
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