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Patent applications and USPTO patent grants for Fender; Bruce J..The latest application filed is for "attachment feature removal from photomask in extreme ultraviolet lithography application".
Patent | Date |
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Method and apparatus for high throughput photomask curing Grant 10,962,889 - Wu , et al. March 30, 2 | 2021-03-30 |
Attachment feature removal from photomask in extreme ultraviolet lithography application Grant 10,928,724 - Wu , et al. February 23, 2 | 2021-02-23 |
Attachment Feature Removal From Photomask In Extreme Ultraviolet Lithography Application App 20200183268 - WU; Banqiu ;   et al. | 2020-06-11 |
Method And Apparatus For High Throughput Photomask Curing App 20200166834 - WU; Banqiu ;   et al. | 2020-05-28 |
Semiconductor Wafer Cleaning With Dilute Acids App 20100024847 - Breese; Ronald G. ;   et al. | 2010-02-04 |
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