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Patent applications and USPTO patent grants for Felzer; Heinz.The latest application filed is for "liquid sputter target".
Patent | Date |
---|---|
Liquid Sputter Target App 20210381099 - Jaeger; Dominik ;   et al. | 2021-12-09 |
Substrate Processing Apparatus And Method Of Processing A Substrate And Of Manufacturing A Processed Workpiece App 20200388517 - Rohrmann; Hartmut ;   et al. | 2020-12-10 |
Sputtering Source App 20190252166 - Felzer; Heinz ;   et al. | 2019-08-15 |
Method for depositing an aluminium nitride layer Grant 9,607,831 - Castaldi , et al. March 28, 2 | 2017-03-28 |
Method for depositing a group III nitride semiconductor film Grant 9,478,420 - Castaldi , et al. October 25, 2 | 2016-10-25 |
Method For Depositing An Aluminium Nitride Layer App 20150179430 - Castaldi; Lorenzo ;   et al. | 2015-06-25 |
Method For Depositing A Group Iii Nitride Semiconductor Film App 20150140792 - Castaldi; Lorenzo ;   et al. | 2015-05-21 |
RF sputtering arrangement Grant 8,268,142 - Weichart , et al. September 18, 2 | 2012-09-18 |
Rf Sputtering Arrangement App 20100155238 - Weichart; Jurgen ;   et al. | 2010-06-24 |
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