loadpatents
Patent applications and USPTO patent grants for Felmetsger; Valery V..The latest application filed is for "sputter deposition of cermet resistor films with low temperature coefficient of resistance".
Patent | Date |
---|---|
Sputter deposition of cermet resistor films with low temperature coefficient of resistance Grant 8,482,375 - Felmetsger July 9, 2 | 2013-07-09 |
Sputter deposition of cermet resistor films with low temperature coefficient of resistance App 20100301989 - Felmetsger; Valery V. | 2010-12-02 |
Permanent adherence of the back end of a wafer to an electrical component or sub-assembly Grant 7,208,396 - Felmetsger April 24, 2 | 2007-04-24 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron Grant 7,179,350 - Laptev , et al. February 20, 2 | 2007-02-20 |
Reactive sputtering of silicon nitride films by RF supported DC magnetron App 20040231972 - Laptev, Pavel N. ;   et al. | 2004-11-25 |
Permanent adherence of the back end of a wafer to an electrical component or sub-assembly App 20030132524 - Felmetsger, Valery V. | 2003-07-17 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.