Feenstra; Randall M.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Feenstra; Randall M..The latest application filed is for "in-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage".
- Feenstra; Randall M. - Mt. Kisco NY
- Feenstra; Randall M. - Tarrytown NY
| Patent | Date |
|---|---|
| In-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage Grant 5,337,015 - Lustig , et al. August 9, 1 | 1994-08-09 |
| Narrow line width pattern fabrication Grant 4,550,257 - Binnig , et al. October 29, 1 | 1985-10-29 |
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