Feeney; Paul M.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Feeney; Paul M..The latest application filed is for "polishing composition containing polyether amine".
- Feeney; Paul M. - Aurora IL US
- Feeney; Paul M. - Richmond VT
| Patent | Date |
|---|---|
| Polishing composition containing polyether amine Grant 8,741,009 - Dysard , et al. June 3, 2 | 2014-06-03 |
| Controlled electrochemical polishing method Grant 7,998,335 - Feeney , et al. August 16, 2 | 2011-08-16 |
| Composition and method for damascene CMP Grant 7,837,888 - Feeney , et al. November 23, 2 | 2010-11-23 |
| Polishing composition containing polyether amine App 20090289033 - Dysard; Jeffrey M. ; et al. | 2009-11-26 |
| Polishing composition containing polyether amine Grant 7,585,340 - Dysard , et al. September 8, 2 | 2009-09-08 |
| CMP of copper/ruthenium/tantalum substrates App 20080105652 - Brusic; Vlasta ; et al. | 2008-05-08 |
| Polishing composition containing polyether amine App 20070251155 - Dysard; Jeffrey M. ; et al. | 2007-11-01 |
| Method for controlling polysilicon removal App 20070077865 - Dysard; Jeffrey M. ; et al. | 2007-04-05 |
| Controlled electrochemical polishing method App 20060281196 - Feeney; Paul M. ; et al. | 2006-12-14 |
| Method of reducing in-trench smearing during polishing Grant 6,841,479 - Cherian , et al. January 11, 2 | 2005-01-11 |
| Preequilibrium polishing method and system Grant 6,726,534 - Bogush , et al. April 27, 2 | 2004-04-27 |
| Chemical-mechanical planarization of metallurgy Grant 6,632,377 - Brusic , et al. October 14, 2 | 2003-10-14 |
| Method of reducing in-trench smearing during polishing App 20020151177 - Cherian, Isaac K. ; et al. | 2002-10-17 |
| Use of CsOH in a dielectric CMP slurry Grant 6,350,393 - Francis , et al. February 26, 2 | 2002-02-26 |
| Chemical mechanical polishing slurry and method for polishing metal/oxide layers App 20010052587 - Feeney, Paul M. ; et al. | 2001-12-20 |
| Use Of Csoh In A Dielectric Cmp Slurry App 20010051433 - Francis, Alicia F. ; et al. | 2001-12-13 |
| Integrated chemical-mechanical polishing App 20010037821 - Staley, Bradley J. ; et al. | 2001-11-08 |
| Wafer carrier for chemical mechanical polishing Grant 6,007,411 - Feeney December 28, 1 | 1999-12-28 |
| SEC | 0001197906 | FEENEY PAUL M |
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