| Patent | Date |
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Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3
Grant 11,143,953 - Sandstrom , et al. October 12, 2 | 2021-10-12 |
PROTECTION OF PHOTOMASKS FROM 193nm RADIATION DAMAGE USING THIN COATINGS OF ALD Al2O3.
App 20200301270 - Sandstrom; Robert L. ; et al. | 2020-09-24 |
Techniques for reducing degradation and/or modifying feature size of photomasks
Grant 8,568,959 - Bartlau , et al. October 29, 2 | 2013-10-29 |
Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks
Grant 7,861,208 - Faure , et al. December 28, 2 | 2010-12-28 |
Method to etch chrome for photomask fabrication
Grant 7,754,394 - Crawford , et al. July 13, 2 | 2010-07-13 |
Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks
Grant 7,709,300 - Faure , et al. May 4, 2 | 2010-05-04 |
Techniques For Reducing Degradation And/or Modifying Feature Size Of Photomasks
App 20100086876 - Bartlau; Peter H. ; et al. | 2010-04-08 |
Design Structure For Partitioned Dummy Fill Shapes For Reduced Mask Bias With Alternating Phase Shift Masks
App 20090100399 - FAURE; Thomas B. ; et al. | 2009-04-16 |
Method to etch chrome for photomask fabrication
App 20080113275 - Crawford; Shaun B. ; et al. | 2008-05-15 |
Structure And Method For Partitioned Dummy Fill Shapes For Reduced Mask Bias With Alternating Phase Shift Masks
App 20080086714 - Faure; Thomas B. ; et al. | 2008-04-10 |
CD uniformity of chrome etch to photomask process
Grant 7,014,959 - Crawford , et al. March 21, 2 | 2006-03-21 |
Improved Cd Uniformity Of Chrome Etch To Photomask Process
App 20040262264 - Crawford, Shaun B. ; et al. | 2004-12-30 |
Method of inhibiting contaminants using dilute acid rinse
Grant 6,758,912 - Chao , et al. July 6, 2 | 2004-07-06 |
Method of inhibiting contaminants using dilute acid rinse
App 20030051740 - Chao, Virginia Chi-Chuen ; et al. | 2003-03-20 |
Method of minimizing contaminating deposits using dilute acid rinse
Grant 6,494,966 - Chao , et al. December 17, 2 | 2002-12-17 |
Single component developer for copolymer resists
Grant 6,270,949 - Faure , et al. August 7, 2 | 2001-08-07 |
Single component developer for use with ghost exposure
App 20010005571 - Faure, Thomas B. ; et al. | 2001-06-28 |
Method of minimizing contaminating deposits using dilute acid rinse
App 20010001958 - Chao, Virginia Chi-Chuen ; et al. | 2001-05-31 |
Dilute acid rinse after develop for chrome etch
Grant 6,162,565 - Chao , et al. December 19, 2 | 2000-12-19 |
Low stress electrodeposition of gold for x-ray mask fabrication
Grant 5,459,001 - Estes , et al. October 17, 1 | 1995-10-17 |
Method of Manufacturing three dimensional integrated device and circuit structures
Grant 5,409,852 - Faure , et al. April 25, 1 | 1995-04-25 |
Low stress electrodeposition of gold for X-ray mask fabrication
Grant 5,318,687 - Estes , et al. June 7, 1 | 1994-06-07 |
Three-dimensional semiconductor structures formed from planar layers
Grant 5,160,987 - Pricer , et al. November 3, 1 | 1992-11-03 |
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