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name:-0.014343976974487
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Faul; Jurgen Patent Filings

Faul; Jurgen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Faul; Jurgen.The latest application filed is for "voltage divider topology circuit structure".

Company Profile
2.11.12
  • Faul; Jurgen - Radebeul DE
  • Faul; Jurgen - Dresden DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Back-gate biasing voltage divider topology circuit structure
Grant 10,775,826 - Hensel , et al. Sept
2020-09-15
Voltage Divider Topology Circuit Structure
App 20200159270 - Hensel; Ulrich G. ;   et al.
2020-05-21
Process for forming semiconductor layers of different thickness in FDSOI technologies
Grant 10,141,229 - Faul , et al. Nov
2018-11-27
Process For Forming Semiconductor Layers Of Different Thickness In Fdsoi Technologies
App 20180090386 - Faul; Jurgen ;   et al.
2018-03-29
Reducing antenna effects in SOI devices
Grant 9,773,811 - Lorenz , et al. September 26, 2
2017-09-26
Reducing Antenna Effects In Soi Devices
App 20170243894 - Lorenz; Ingolf ;   et al.
2017-08-24
Method for the production of a semiconductor substrate comprising a plurality of gate stacks on a semiconductor substrate, and corresponding semiconductor structure
Grant 7,679,120 - Amon , et al. March 16, 2
2010-03-16
Integrated Circuit Comprising a Field Effect Transistor and Method of Fabricating the Same
App 20090121286 - Goldbach; Matthias ;   et al.
2009-05-14
Method of manufacturing an integrated circuit
App 20090098701 - Faul; Jurgen ;   et al.
2009-04-16
Method for the production of a semiconductor substrate comprising a plurality of gate stacks on a semiconductor substrate, and corresponding semiconductor structure
App 20070205437 - Amon; Jurgen ;   et al.
2007-09-06
Method for fabricating a semiconductor structure
Grant 7,259,060 - Amon , et al. August 21, 2
2007-08-21
Method for the production of a semiconductor substrate comprising a plurality of gate stacks on a semiconductor substrate, and corresponding semiconductor structure
Grant 7,118,955 - Amon , et al. October 10, 2
2006-10-10
Process for producing a doped semiconductor substrate
Grant 7,078,325 - Curello , et al. July 18, 2
2006-07-18
Method for fabricating a semiconductor structure
Grant 6,967,133 - Amon , et al. November 22, 2
2005-11-22
Method for fabricating a p-channel field-effect transistor on a semiconductor substrate
Grant 6,943,116 - Alsmeier , et al. September 13, 2
2005-09-13
Method For Fabricating A P-channel Field-effect Transistor On A Semiconductor Substrate
App 20050148178 - Alsmeier, Johann ;   et al.
2005-07-07
Method for the production of a semiconductor substrate comprising a plurality of gate stacks on a semiconductor substrate, and corresponding semiconductor structure
App 20050130370 - Amon, Jurgen ;   et al.
2005-06-16
Method for fabricating a semiconductor structure
App 20050124124 - Amon, Jurgen ;   et al.
2005-06-09
Trench capacitor with an insulation collar and method for producing a trench capacitor
Grant 6,828,191 - Wurster , et al. December 7, 2
2004-12-07
Method for fabricating a semiconductor structure
App 20040115874 - Amon, Jurgen ;   et al.
2004-06-17
Memory with trench capacitor and selection transistor and method for fabricating it
Grant 6,664,167 - Temmler , et al. December 16, 2
2003-12-16
Memory with trench capacitor and selection transistor and method for fabricating it
App 20020137278 - Temmler, Dietmar ;   et al.
2002-09-26
Process for producing a doped semiconductor substrate
App 20020016049 - Curello, Giuseppe ;   et al.
2002-02-07

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