Farrow; Reginald Conway
Patent Applications and Registrations
Patent applications and USPTO patent grants for Farrow; Reginald Conway.The latest application filed is for "smart shunt devices and methods".
- Farrow; Reginald Conway - Somerset NJ
- Farrow; Reginald Conway - East Brunswick NJ
| Patent | Date |
|---|---|
| Smart shunt devices and methods Grant 9,861,524 - Thomas , et al. January 9, 2 | 2018-01-09 |
| Smart Shunt Devices And Methods App 20140309577 - Thomas; Gordon Albert ; et al. | 2014-10-16 |
| Vibration powered impact recorder (VPIR) Grant 8,571,835 - Farrow , et al. October 29, 2 | 2013-10-29 |
| No clog shunt using a compact fluid drag path Grant 8,088,091 - Thomas , et al. January 3, 2 | 2012-01-03 |
| Nanotube Device and Method of Fabrication App 20110240480 - Farrow; Reginald Conway ; et al. | 2011-10-06 |
| Nanotube device and method of fabrication Grant 7,964,143 - Farrow , et al. June 21, 2 | 2011-06-21 |
| Vibration Powered Impact Recorder (vpir) App 20110004444 - Farrow; Reginald Conway ; et al. | 2011-01-06 |
| No clog shunt using a compact fluid drag path App 20100228179 - Thomas; Gordon A. ; et al. | 2010-09-09 |
| Method of Forming Nanotube Vertical Field Effect Transistor App 20100207103 - Farrow; Reginald Conway ; et al. | 2010-08-19 |
| Method of forming nanotube vertical field effect transistor Grant 7,736,979 - Farrow , et al. June 15, 2 | 2010-06-15 |
| Method of Forming Nanotube Vertical Field Effect Transistor App 20080315302 - Farrow; Reginald Conway ; et al. | 2008-12-25 |
| Nanotube Device and Method of Fabrication App 20080317631 - Farrow; Reginald Conway ; et al. | 2008-12-25 |
| Alignment mark fabrication process to limit accumulation of errors in level to level overlay Grant 6,440,816 - Farrow , et al. August 27, 2 | 2002-08-27 |
| Alignment Mark Fabrication Process To Limit Accumulation Of Errors In Level To Level Overlay App 20020102811 - Farrow, Reginald Conway ; et al. | 2002-08-01 |
| Manufacturing system error detection Grant 5,906,902 - Farrow May 25, 1 | 1999-05-25 |
| Lithographic process for device fabrication utilizing back-scattered electron beam signal intensity for alignment Grant 5,824,441 - Farrow , et al. October 20, 1 | 1998-10-20 |
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