Farnsworth; Jeff

Patent Applications and Registrations

Patent applications and USPTO patent grants for Farnsworth; Jeff.The latest application filed is for "adaptive media messaging, such as for rich media messages incorporating digital content".

Company Profile

0.5.8

Farnsworth; Jeff - Portland OR
Farnsworth; Jeff - Hillsboro OR
Farnsworth; Jeff - Los Gatos CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Adaptive Media Messaging, Such As For Rich Media Messages Incorporating Digital Content App 20110302258 - Huynh; Hemingway ; et al.	2011-12-08
Adaptive media messaging, such as for rich media messages incorporating digital content Grant 7,966,374 - Huynh , et al. June 21, 2	2011-06-21
Alternating phase shift masking App 20070231712 - Pang; Song ; et al.	2007-10-04
Active secondary exposure mask to manufacture integrated circuits Grant 7,014,956 - Chen , et al. March 21, 2	2006-03-21
Modifying circuitry features in radiation sensitive layers with active secondary exposure masks Grant 6,942,958 - Chen , et al. September 13, 2	2005-09-13
Modifying circuitry features in radiation sensitive layers with active secondary exposure masks App 20040170906 - Chen, Fred ; et al.	2004-09-02
Photomask frame modification to eliminate process induced critical dimension control variation Grant 6,692,878 - Tsai , et al. February 17, 2	2004-02-17
Adaptive media messaging, such as for rich media messages incorporating digital content App 20040019648 - Huynh, Hemingway ; et al.	2004-01-29
Active secondary exposure mask to manufacture integrated circuits App 20030129502 - Chen, Fred ; et al.	2003-07-10
Exposed phase edge mask method for generating periodic structures with subwavelength feature App 20030039893 - Farnsworth, Jeff ; et al.	2003-02-27
Photomask frame modification to eliminate process induced critical dimension control variation App 20030008221 - Tsai, Wilman ; et al.	2003-01-09
Photomask frame modification to eliminate process induced critical dimension control variation Grant 6,485,869 - Tsai , et al. November 26, 2	2002-11-26
Photomask Frame Modification To Eliminate Process Induced Critical Dimension Control Variation App 20020132170 - TSAI, WILMAN ; et al.	2002-09-19

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