Fang; ZhiYuan
Patent Applications and Registrations
Patent applications and USPTO patent grants for Fang; ZhiYuan.The latest application filed is for "chamber-accumulation extension via in-situ passivation".
- Fang; ZhiYuan - West Linn OR
| Patent | Date |
|---|---|
| Chamber-accumulation Extension Via In-situ Passivation App 20220267900 - Fang; ZhiYuan ; et al. | 2022-08-25 |
| Methods of depositing smooth and conformal ashable hard mask films Grant 9,240,320 - Subramonium , et al. January 19, 2 | 2016-01-19 |
| Diffusion barrier and etch stop films Grant 8,669,181 - Yu , et al. March 11, 2 | 2014-03-11 |
| Plasma Clean Method For Deposition Chamber App 20140053867 - Fang; Zhiyuan ; et al. | 2014-02-27 |
| Plasma clean method for deposition chamber Grant 8,591,659 - Fang , et al. November 26, 2 | 2013-11-26 |
| Methods of depositing smooth and conformal ashable hard mask films Grant 8,435,608 - Subramonium , et al. May 7, 2 | 2013-05-07 |
| Pulsed PECVD method for modulating hydrogen content in hard mask Grant 8,110,493 - Subramonium , et al. February 7, 2 | 2012-02-07 |
| Methods of depositing stable and hermetic ashable hardmask films Grant 7,981,777 - Subramonium , et al. July 19, 2 | 2011-07-19 |
| Methods of depositing highly selective transparent ashable hardmask films Grant 7,981,810 - Subramonium , et al. July 19, 2 | 2011-07-19 |
| Diffusion barrier and etch stop films Grant 7,915,166 - Yu , et al. March 29, 2 | 2011-03-29 |
| Pulsed PECVD method for modulating hydrogen content in hard mask Grant 7,381,644 - Subramonium , et al. June 3, 2 | 2008-06-03 |
| Nitrogen-free fluorine-doped silicate glass App 20040091717 - Li, Ming ; et al. | 2004-05-13 |
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