Fan; Yiwen
Patent Applications and Registrations
Patent applications and USPTO patent grants for Fan; Yiwen.The latest application filed is for "photoresist development with halide chemistries".
- Fan; Yiwen - Fremont CA
| Patent | Date |
|---|---|
| Photoresist Development With Halide Chemistries App 20220244645 - Tan; Samantha SiamHwa ; et al. | 2022-08-04 |
| Atomic Layer Etching For Subtractive Metal Etch App 20220199422 - YANG; Wenbing ; et al. | 2022-06-23 |
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