loadpatents
Patent applications and USPTO patent grants for Fan; Yang-Kai.The latest application filed is for "wet processing apparatuses".
Patent | Date |
---|---|
Wet processing apparatuses Grant 8,871,032 - Tang , et al. October 28, 2 | 2014-10-28 |
Wet Processing Apparatuses App 20130263900 - Tang; Kuang-Nian ;   et al. | 2013-10-10 |
Wet processing apparatuses Grant 8,460,478 - Tang , et al. June 11, 2 | 2013-06-11 |
Apparatus And Method Of In-situ Identification For Contamination Control In Semiconductor Fabrication App 20100279438 - An; Su Chao ;   et al. | 2010-11-04 |
Wet Processing Apparatuses App 20080295874 - Tang; Kuang-Nian ;   et al. | 2008-12-04 |
Dual-tank etch method for oxide thickness control Grant 7,405,165 - Fan , et al. July 29, 2 | 2008-07-29 |
Systems and methods of controlling systems App 20070190474 - Su; Chao An ;   et al. | 2007-08-16 |
Dual-tank etch method for oxide thickness control App 20060099818 - Fan; Yang Kai ;   et al. | 2006-05-11 |
Plasma etch chamber equipped with multi-layer insert ring App 20040000375 - Liu, Hsiang-Hsing ;   et al. | 2004-01-01 |
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