Fan; Wei-Han

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fan; Wei-Han.The latest application filed is for "source and drain surface treatment for multi-gate field effect transistors".

Company Profile

5.24.19

Fan; Wei-Han - Hsin-Chu TW
Fan; Wei-Han - Hsin-Chu City TW
Fan; Wei-Han - Hsinchu TW
Fan; Wei-Han - Hsinchu City TW
Fan; Wei-Han - Hsin-Chun City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Source and drain surface treatment for multi-gate field effect transistors Grant 10,868,149 - Fan , et al. December 15, 2	2020-12-15
Source and Drain Surface Treatment for Multi-Gate Field Effect Transistors App 20200044062 - Fan; Wei-Han ; et al.	2020-02-06
Source and drain surface treatment for multi-gate field effect transistors Grant 10,446,669 - Fan , et al. Oc	2019-10-15
Source and Drain Surface Treatment for Multi-Gate Field Effect Transistors App 20190165139 - Fan; Wei-Han ; et al.	2019-05-30
Semiconductor Device including an Epitaxy Region App 20190123198 - Pan; Te-Jen ; et al.	2019-04-25
Semiconductor device including an epitaxy region Grant 10,164,093 - Pan , et al. Dec	2018-12-25
Method of manufacturing strained source/drain structures Grant 9,698,057 - Nieh , et al. July 4, 2	2017-07-04
Semiconductor Device Including An Epitaxy Region App 20170186867 - Pan; Te-Jen ; et al.	2017-06-29
Semiconductor device including an epitaxy region Grant 9,595,477 - Pan , et al. March 14, 2	2017-03-14
High performance strained source-drain structure and method of fabricating the same Grant 9,293,537 - Sung , et al. March 22, 2	2016-03-22
Spacer elements for semiconductor device Grant 9,153,655 - Lin , et al. October 6, 2	2015-10-06
Method of Manufacturing Strained Source/Drain Structures App 20150262886 - Nieh; Chun-Feng ; et al.	2015-09-17
Method for fabricating semiconductor device having spacer elements Grant 9,111,906 - Lin , et al. August 18, 2	2015-08-18
Method of manufacturing strained source/drain structures Grant 9,048,253 - Nieh , et al. June 2, 2	2015-06-02
High Performance Strained Source-Drain Structure and Method of Fabricating the Same App 20140319581 - Sung; Hsueh-Chang ; et al.	2014-10-30
Spacer Elements For Semiconductor Device App 20140291768 - Lin; Yun Jing ; et al.	2014-10-02
Method For Fabricating Semiconductor Device Having Spacer Elements App 20140248752 - Lin; Yun Jing ; et al.	2014-09-04
Spacer Elements For Semiconductor Device App 20140246728 - Lin; Yun Jing ; et al.	2014-09-04
Semiconductor device having a first spacer element and an adjacent second spacer element Grant 8,735,988 - Lin , et al. May 27, 2	2014-05-27
High performance strained source-drain structure and method of fabricating the same Grant 8,709,897 - Sung , et al. April 29, 2	2014-04-29
Facet-free semiconductor device Grant 8,680,625 - Fan , et al. March 25, 2	2014-03-25
Method of Manufacturing Strained Source/Drain Structures App 20140024188 - Nieh; Chun-Feng ; et al.	2014-01-23
Method of manufacturing strained source/drain structures Grant 8,569,139 - Nieh , et al. October 29, 2	2013-10-29
Spacer Elements for Semiconductor Device App 20130234255 - Lin; Yun Jing ; et al.	2013-09-12
Spacer elements for semiconductor device Grant 8,455,952 - Lin , et al. June 4, 2	2013-06-04
Source and drain feature profile for improving device performance Grant 8,445,940 - Tsai , et al. May 21, 2	2013-05-21
Strained semiconductor device with recessed channel Grant 8,368,147 - Cheng , et al. February 5, 2	2013-02-05
Integrated Circuit Device With Well Controlled Surface Proximity And Method Of Manufacturing Same App 20120273847 - Tsai; Ming-Huan ; et al.	2012-11-01
Semiconductor Device Including An Epitaxy Region App 20120187459 - Pan; Te-Jen ; et al.	2012-07-26
Method of manufacturing integrated circuit device with well controlled surface proximity Grant 8,216,906 - Tsai , et al. July 10, 2	2012-07-10
High Performance Strained Source-drain Structure And Method Of Fabricating The Same App 20120132957 - Sung; Hsueh-Chang ; et al.	2012-05-31
Spacer Elements For Semiconductor Device App 20120126331 - Lin; Yun Jing ; et al.	2012-05-24
Method Of Manufacturing Strained Source/drain Structures App 20120108026 - NIEH; Chun-Feng ; et al.	2012-05-03
Facet-free Semiconductor Device App 20120091539 - Fan; Wei-Han ; et al.	2012-04-19
Integrated Circuit Device With Well Controlled Surface Proximity And Method Of Manufacturing Same App 20120001238 - Tsai; Ming-Huan ; et al.	2012-01-05
Strained Semiconductor Device with Recessed Channel App 20110254105 - Cheng; Chun-Fai ; et al.	2011-10-20

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.