loadpatents
name:-0.026116132736206
name:-0.018495082855225
name:-0.0050680637359619
Fan; Ming-Yu Patent Filings

Fan; Ming-Yu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fan; Ming-Yu.The latest application filed is for "using semi-supervised label procreation to train a risk determination model".

Company Profile
2.11.11
  • Fan; Ming-Yu - Bellevue WA
  • Fan; Ming-Yu - PeiPu TW
  • Fan; Ming-Yu - Chang-Chun TW
  • Fan; Ming-Yu - HsinChu County TW
  • Fan; Ming-Yu - Hsin-Chu County N/A TW
  • Fan; Ming-Yu - PiePu TW
  • Fan; Ming-Yu - Hsin-Chu TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Using semi-supervised label procreation to train a risk determination model
Grant 11,250,433 - Marcjan , et al. February 15, 2
2022-02-15
Using Semi-Supervised Label Procreation to Train A Risk Determination Model
App 20190130406 - Marcjan; Cezary A. ;   et al.
2019-05-02
Anomaly Detection In Data Transactions
App 20190114639 - Nick; Eric W. ;   et al.
2019-04-18
Multi-zone temperature control for semiconductor wafer
Grant 10,113,233 - Chang , et al. October 30, 2
2018-10-30
Multi-zone Temperature Control For Semiconductor Wafer
App 20170022611 - CHANG; Chun-Lin ;   et al.
2017-01-26
Multi-zone Temperature Control For Semiconductor Wafer
App 20150211122 - CHANG; Chun-Lin ;   et al.
2015-07-30
Multi-zone temperature control for semiconductor wafer
Grant 9,023,664 - Chang , et al. May 5, 2
2015-05-05
Multi-zone Temperature Control For Semiconductor Wafer
App 20130171746 - Chang; Chun-Lin ;   et al.
2013-07-04
Multi-zone temperature control for semiconductor wafer
Grant 8,404,572 - Chang , et al. March 26, 2
2013-03-26
Advanced process control with novel sampling policy
Grant 8,392,009 - Fei , et al. March 5, 2
2013-03-05
Method and system for tuning advanced process control parameters
Grant 8,229,588 - Tsen , et al. July 24, 2
2012-07-24
System and method for implementing a wafer acceptance test ("WAT") advanced process control ("APC") with novel sampling policy and architecture
Grant 8,108,060 - Tsen , et al. January 31, 2
2012-01-31
Method and system of monitoring E-beam overlay and providing advanced process control
Grant 7,977,655 - Wang , et al. July 12, 2
2011-07-12
Method And System Of Monitoring E-beam Overlay And Providing Advanced Process Control
App 20100294955 - Wang; Jo Fei ;   et al.
2010-11-25
System And Method For Implementing A Wafer Acceptance Test ("wat") Advanced Process Control ("apc") With Novel Sampling Policy And Architecture
App 20100292824 - Tsen; Andy ;   et al.
2010-11-18
Advanced Process Control With Novel Sampling Policy
App 20100249974 - Fei; Wang Jo ;   et al.
2010-09-30
Method And System For Tuning Advanced Process Control Parameters
App 20100228370 - Tsen; Andy ;   et al.
2010-09-09
Multi-zone Temperature Control For Semiconductor Wafer
App 20100210041 - Chang; Chun-Lin ;   et al.
2010-08-19
Reticle position detection system
Grant 6,998,629 - Fan February 14, 2
2006-02-14
Reticle position detection system
App 20040164256 - Fan, Ming-Yu
2004-08-26

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