Falster; Robert

Patent Applications and Registrations

Patent applications and USPTO patent grants for Falster; Robert.The latest application filed is for "method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield".

Company Profile

0.7.3

Falster; Robert - Woodstock GB
Falster; Robert - Milan IT
Falster, Robert - London GB
Falster; Robert - Oxford OX1 3PH GB3

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Treating Silicon Wafers To Have Intrinsic Gettering And Gate Oxide Integrity Yield App 20180182641 - Lee; Young Jung ; et al.	2018-06-28
Ideal oxygen precipitating silicon wafer having an asymmetrical vacancy concentration profile and a process for the preparation thereof Grant 6,586,068 - Falster , et al. July 1, 2	2003-07-01
Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor App 20020026893 - Falster, Robert ; et al.	2002-03-07
Low Defect Density, Self-interstitial Dominated Silicon App 20020007779 - MULE'STAGNO, LUCIANO ; et al.	2002-01-24
Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Grant 6,204,152 - Falster , et al. March 20, 2	2001-03-20
Ideal Oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Grant 6,180,220 - Falster , et al. January 30, 2	2001-01-30
Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Grant 5,994,761 - Falster , et al. November 30, 1	1999-11-30
Precision controlled precipitation of oxygen in silicon Grant 5,593,494 - Falster January 14, 1	1997-01-14
Process for the preparation of silicon wafers having controlled distribution of oxygen precipitate nucleation centers Grant 5,401,669 - Falster , et al. March 28, 1	1995-03-28
Infra-red scanning microscopy Grant 5,262,646 - Booker , et al. November 16, 1	1993-11-16

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